Automated alignment of XFEL nanofocusing mirrors via wavefront optimization

Yamada, Jumpei; Yamaguchi, Gota; Inoue, Ichiro; Osaka, Taito; Inubushi, Yuichi; Yabashi, Makina

doi:https://doi.org/10.1107/S1600577525008434

Automated alignment of XFEL nanofocusing mirrors via wavefront optimization

Yamada, Jumpei; Yamaguchi, Gota; Inoue, Ichiro et al.

Journal of Synchrotron Radiation, 2025, 32, 1534-1538

アクセス数:58件（2026-02-15 18:00 集計）

固定URL: https://hdl.handle.net/11094/103455

閲覧可能ファイル

ファイル	フォーマット	利用条件	サイズ	閲覧回数	利用開始日	説明	information
JSynchrotronRadiat_32_1534	pdf	なし	5.69 MB	24	2025.12.25

Creative Commons : 表示

論文情報

ファイル出力 EndNote Basic出力 Mendeley出力

タイトル	Automated alignment of XFEL nanofocusing mirrors via wavefront optimization
著者	NRID 1000010845027 1000010845027 researchmap permalink J_Y190325 J_Y190325 著者名 Yamada, Jumpei
	NRID 1000020956148 1000020956148 著者名 Yamaguchi, Gota
	NRID 1000030783401 1000030783401 著者名 Inoue, Ichiro
	著者名 Osaka, Taito
	NRID 1000040506250 1000040506250 著者名 Inubushi, Yuichi
	NRID 1000000372144 1000000372144 著者名 Yabashi, Makina
キーワード等	beamline automation
	wavefront sensing
	X-ray free-electron lasers
	X-ray mirrors
	X-ray nanofocusing
内容	Yamada J., Yamaguchi G., Inoue I., et al. Automated alignment of XFEL nanofocusing mirrors via wavefront optimization. Journal of Synchrotron Radiation 32, 1534 (2025); https://doi.org/10.1107/S1600577525008434.
抄録	An automated alignment procedure, based on wavefront measurement with a single-grating interferometer, has been developed for precise tuning of Kirkpatrick-Baez nanofocusing mirrors for X-ray free-electron lasers (XFELs). This approach optimizes focus size and maximizes peak intensity while minimizing aberrations. Wavefront errors are quantitatively correlated with alignment deviations - incidence angle, perpendicularity and astigmatism - via Legendre polynomial analysis. These errors are subsequently corrected through a straightforward optimization process. Implemented at the SPring-8 Angstrom Compact Free-Electron Laser (SACLA), the system consistently achieves a reproducible XFEL focus below 150 nm × 200 nm within 10 min. Routine operation at SACLA demonstrates the reliability and efficacy of this method, enabling rapid restoration of optimal nanofocusing conditions.
出版者	International Union of Crystallography
収録物名	Journal of Synchrotron Radiation
巻(号)	32
ページ	1534-1538
刊行年月	2025-11-01
言語	英語
ハンドルURL	https://hdl.handle.net/11094/103455
PISSN	09090495
eISSN	16005775
関連情報 (isIdenticalTo)	DOI (出版社版) https://doi.org/10.1107/S1600577525008434
アクセス権	open access
権利情報	This article is licensed under a Creative Commons Attribution 4.0 International License.
出版タイプ	Version of Record
カテゴリ	学術雑誌論文 Journal Article

資源タイプ	学術雑誌論文
ローカル資源タイプ	学術雑誌論文
DCMI資源タイプ	text
DCTERMS.bibliographicCitation	Journal of Synchrotron Radiation. 2025, 32, p. 1534-1538
DC.title	Automated alignment of XFEL nanofocusing mirrors via wavefront optimization
DC.creator	Yamada, Jumpei
	Yamaguchi, Gota
	Inoue, Ichiro
	Osaka, Taito
	Inubushi, Yuichi
	Yabashi, Makina
DC.publisher	International Union of Crystallography
DC.language' scheme='DCTERMS.RFC1766	英語
DC.type' scheme='DCTERMS.DCMIType	text
DCTERMS.issued' scheme='DCTERMS.W3CDTF	2025-11-01
DC.identifier	https://doi.org/10.1107/S1600577525008434
DC.subject	beamline automation
	wavefront sensing
	X-ray free-electron lasers
	X-ray mirrors
	X-ray nanofocusing
DC.description	Yamada J., Yamaguchi G., Inoue I., et al. Automated alignment of XFEL nanofocusing mirrors via wavefront optimization. Journal of Synchrotron Radiation 32, 1534 (2025); https://doi.org/10.1107/S1600577525008434.
DCTERMS.abstract	An automated alignment procedure, based on wavefront measurement with a single-grating interferometer, has been developed for precise tuning of Kirkpatrick-Baez nanofocusing mirrors for X-ray free-electron lasers (XFELs). This approach optimizes focus size and maximizes peak intensity while minimizing aberrations. Wavefront errors are quantitatively correlated with alignment deviations - incidence angle, perpendicularity and astigmatism - via Legendre polynomial analysis. These errors are subsequently corrected through a straightforward optimization process. Implemented at the SPring-8 Angstrom Compact Free-Electron Laser (SACLA), the system consistently achieves a reproducible XFEL focus below 150 nm × 200 nm within 10 min. Routine operation at SACLA demonstrates the reliability and efficacy of this method, enabling rapid restoration of optimal nanofocusing conditions.
DC.rights	This article is licensed under a Creative Commons Attribution 4.0 International License.
DC.format	103455
citation_title	Automated alignment of XFEL nanofocusing mirrors via wavefront optimization
citation_author	Yamada, Jumpei
	Yamaguchi, Gota
	Inoue, Ichiro
	Osaka, Taito
	Inubushi, Yuichi
	Yabashi, Makina
citation_publisher	International Union of Crystallography
citation_language	英語
citation_date	2025-11-01
citation_journal_title	Journal of Synchrotron Radiation
citation_volume	32
citation_firstpage	1534
citation_lastpage	1538
citation_doi	https://doi.org/10.1107/S1600577525008434
citation_public_url	https://hdl.handle.net/11094/103455

Automated alignment of XFEL nanofocusing mirrors via wavefront optimization

閲覧可能ファイル

論文情報

論文詳細を表示