Fabrication of nanoscale gaps using a combination of self-assembled molecular and electron beam lithographic techniques

Negishi, R; Hasegawa, T; Terabe, K et al.

APPLIED PHYSICS LETTERS, 2006, 88(22), 223111-1-223111-3

アクセス数:271件（2025-05-09 18:34 集計）

固定URL: https://hdl.handle.net/11094/3175

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タイトル	Fabrication of nanoscale gaps using a combination of self-assembled molecular and electron beam lithographic techniques
著者	著者名 Negishi, R
	著者名 Hasegawa, T
	著者名 Terabe, K
	著者名 Aono, M
	NRID 1000010813975 1000010813975 ORCID 0000-0003-4101-0419 0000-0003-4101-0419 researchmap permalink ebihara830 ebihara830 著者名 Ebihara, T
	著者名 Tanaka, H
	NRID 1000080169185 1000080169185 著者名 Ogawa, T
内容	Copyright 2006 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in Applied Physics Letters, 88(22), 223111, 2006 and may be found at http://dx.doi.org/10.1063/1.2209208
出版者	American Institute of Physics
収録物名	APPLIED PHYSICS LETTERS
巻(号)	88(22)
ページ	223111-1-223111-3
刊行年月	2006-05-29
言語	英語
ハンドルURL	https://hdl.handle.net/11094/3175
PISSN	00036951
NCID	AA00543431
関連情報 (isIdenticalTo)	DOI (出版社版) https://doi.org/10.1063/1.2209208
アクセス権	open access
出版タイプ	Version of Record
カテゴリ	学術雑誌論文 Journal Article

資源タイプ	学術雑誌論文
ローカル資源タイプ	学術雑誌論文
DCMI資源タイプ	text
DCTERMS.bibliographicCitation	APPLIED PHYSICS LETTERS. 2006, 88(22), p. 223111-1-223111-3
DC.title	Fabrication of nanoscale gaps using a combination of self-assembled molecular and electron beam lithographic techniques
DC.creator	Negishi, R
	Hasegawa, T
	Terabe, K
	Aono, M
	Ebihara, T
	Tanaka, H
	Ogawa, T
DC.publisher	American Institute of Physics
DC.language' scheme='DCTERMS.RFC1766	英語
DC.type' scheme='DCTERMS.DCMIType	text
DCTERMS.issued' scheme='DCTERMS.W3CDTF	2006-05-29
DC.identifier	https://doi.org/10.1063/1.2209208
DC.description	Copyright 2006 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in Applied Physics Letters, 88(22), 223111, 2006 and may be found at http://dx.doi.org/10.1063/1.2209208
DC.format	3175
citation_title	Fabrication of nanoscale gaps using a combination of self-assembled molecular and electron beam lithographic techniques
citation_author	Negishi, R
	Hasegawa, T
	Terabe, K
	Aono, M
	Ebihara, T
	Tanaka, H
	Ogawa, T
citation_publisher	American Institute of Physics
citation_language	英語
citation_date	2006-05-29
citation_journal_title	APPLIED PHYSICS LETTERS
citation_volume	88
citation_issue	22
citation_firstpage	223111-1
citation_lastpage	223111-3
citation_doi	https://doi.org/10.1063/1.2209208
citation_public_url	https://hdl.handle.net/11094/3175