Development of a Meters-Scale Large Area Plasma Reactor Using Multiple Low-Inductance Antenna Modules for Giant Electronics Processing

Setsuhara, Yuichi; Ono, Kouichi; Ebe, Akinori

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タイトル	Development of a Meters-Scale Large Area Plasma Reactor Using Multiple Low-Inductance Antenna Modules for Giant Electronics Processing
著者	Setsuhara, Yuichi Setsuhara, Yuichi
	Ono, Kouichi Ono, Kouichi
	Ebe, Akinori Ebe, Akinori
キーワード等	Large-Area Plasma
	High-Density Plasma
	Plasma-Fluid Simulation
抄録	Feasibility of uniform meters-scale high-density plasma production using LIA modules has been demonstrated on the basis of three-dimensional plasma simulation. Furthermore, plasma control methods are described for understanding and designing the meters-size/ultra-large-area and high-density RF plasma sources driven by inductive coupling with LIA modules. The results show that these type of ICP driven by the internal LIA unit are quite attractive as plasma sources for a variety of giant electronics processing.
公開者	大阪大学接合科学研究所
公開者の別表記	Joining and Welding Research Institute, Osaka University
公開者 (ヨミ)	オオサカダイガクセツゴウカガクケンキュウジョ
掲載誌名	Transactions of JWRI
巻	36
号	2
開始ページ	95
終了ページ	97
刊行年月	2007-12
ISSN	03874508
NCID	AA00867058
URL	http://hdl.handle.net/11094/4138
言語	英語

著者版フラグ	publisher
NII資源タイプ	紀要論文
ローカル資源タイプ	紀要論文
dcmi資源タイプ	text
DCTERMS.bibliographicCitation	Transactions of JWRI.36(2) P.95-P.97
DC.title	Development of a Meters-Scale Large Area Plasma Reactor Using Multiple Low-Inductance Antenna Modules for Giant Electronics Processing
DC.creator	Setsuhara, Yuichi
	Ono, Kouichi
	Ebe, Akinori
DC.publisher	大阪大学接合科学研究所
DC.language" scheme="DCTERMS.RFC1766	英語
DCTERMS.issued" scheme="DCTERMS.W3CDTF	2007-12
DC.identifier" scheme="DCTERMS.URI	http://hdl.handle.net/11094/4138
DC.subject	Large-Area Plasma
	High-Density Plasma
	Plasma-Fluid Simulation
DCTERMS.abstract	Feasibility of uniform meters-scale high-density plasma production using LIA modules has been demonstrated on the basis of three-dimensional plasma simulation. Furthermore, plasma control methods are described for understanding and designing the meters-size/ultra-large-area and high-density RF plasma sources driven by inductive coupling with LIA modules. The results show that these type of ICP driven by the internal LIA unit are quite attractive as plasma sources for a variety of giant electronics processing.
citation_title	Development of a Meters-Scale Large Area Plasma Reactor Using Multiple Low-Inductance Antenna Modules for Giant Electronics Processing
citation_author	Setsuhara, Yuichi
	Ono, Kouichi
	Ebe, Akinori
citation_publisher	大阪大学接合科学研究所
citation_language	英語
citation_date	2007-12
citation_journal_title	Transactions of JWRI
citation_volume	36
citation_issue	2
citation_firstpage	95
citation_lastpage	97
citation_issn	03874508
citation_public_url	http://hdl.handle.net/11094/4138
citation_keywords	Large-Area Plasma
	High-Density Plasma
	Plasma-Fluid Simulation

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