Comparative Study of Mg-Si Films Deposited by DC- and RF- Glow Discharge Sputtering

Serikawa, Tadashi; Kawabata, Kenshi; Kondoh, Katsuyoshi

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タイトル	Comparative Study of Mg-Si Films Deposited by DC- and RF- Glow Discharge Sputtering
著者	Serikawa, Tadashi Serikawa, Tadashi
	Kawabata, Kenshi Kawabata, Kenshi
	Kondoh, Katsuyoshi Kondoh, Katsuyoshi
キーワード等	Glow Discharge
	Direct Current (DC-) Sputtering
	Radio Frequency (RF-) Sputtering
	Intermetallic Compound
	Magnesium Silicide (Mg2Si)
	Mg-Si Thin Films
抄録	Mg-Si thin films were deposited at low substrate temperature by direct current (DC)- and radio frequency (RF)- glow discharge sputtering from targets composed of Mg and Si plates with area ratios of 25%:75% and 50%:50%. X-ray diffraction measurements clarified that films deposited by both DC- and RF- glow discharge sputtering from the target of Mg:Si =25%:75% showed the intermetallic compound magnesium silicide (Mg₂Si). Structural, mechanical, and corrosion-resistance properties of Mg-Si films deposited from the target of Mg:Si =25%:75% were examined. The films for both DC- and RF- sputtering showed stack structures consisting of crystalline Mg₂Si layers with columnar and amorphous phase layers. However, the amorphous phase layer for an RF-sputtered film was shown to be much thicker than that for the DC-sputtered film. Mechanical properties of elastic modulus and hardness measured by the nano-indentor method for RF-sputtered films were higher than those for DC-sputtered films. Corrosion-resistance tests in a 5% sodium spray test showed that RF-sputtered films also had superior corrosion-resistance properties to DC-sputtered films. These mechanical and corrosion-resistance properties are strictly caused by the crystalline property and film structure of sputtered Mg-Si films. In this paper, the properties of DC- and RF- sputtered films are also discussed together with film deposition.
公開者	大阪大学接合科学研究所
公開者の別表記	Joining and Welding Research Institute, Osaka University
公開者 (ヨミ)	オオサカダイガクセツゴウカガクケンキュウジョ
掲載誌名	Transactions of JWRI
巻	36
号	2
開始ページ	39
終了ページ	43
刊行年月	2007-12
ISSN	03874508
NCID	AA00867058
URL	http://hdl.handle.net/11094/5801
言語	英語
カテゴリ	紀要論文 Departmental Bulletin Paper
カテゴリ	Transactions of JWRI / Vol.36 No.2 (2007-12)

著者版フラグ	publisher
NII資源タイプ	紀要論文
ローカル資源タイプ	紀要論文
dcmi資源タイプ	text
DCTERMS.bibliographicCitation	Transactions of JWRI.36(2) P.39-P.43
DC.title	Comparative Study of Mg-Si Films Deposited by DC- and RF- Glow Discharge Sputtering
DC.creator	Serikawa, Tadashi
	Kawabata, Kenshi
	Kondoh, Katsuyoshi
DC.publisher	大阪大学接合科学研究所
DC.language" scheme="DCTERMS.RFC1766	英語
DCTERMS.issued" scheme="DCTERMS.W3CDTF	2007-12
DC.identifier" scheme="DCTERMS.URI	http://hdl.handle.net/11094/5801
DC.subject	Glow Discharge
	Direct Current (DC-) Sputtering
	Radio Frequency (RF-) Sputtering
	Intermetallic Compound
	Magnesium Silicide (Mg2Si)
	Mg-Si Thin Films
DCTERMS.abstract	Mg-Si thin films were deposited at low substrate temperature by direct current (DC)- and radio frequency (RF)- glow discharge sputtering from targets composed of Mg and Si plates with area ratios of 25%:75% and 50%:50%. X-ray diffraction measurements clarified that films deposited by both DC- and RF- glow discharge sputtering from the target of Mg:Si =25%:75% showed the intermetallic compound magnesium silicide (Mg₂Si). Structural, mechanical, and corrosion-resistance properties of Mg-Si films deposited from the target of Mg:Si =25%:75% were examined. The films for both DC- and RF- sputtering showed stack structures consisting of crystalline Mg₂Si layers with columnar and amorphous phase layers. However, the amorphous phase layer for an RF-sputtered film was shown to be much thicker than that for the DC-sputtered film. Mechanical properties of elastic modulus and hardness measured by the nano-indentor method for RF-sputtered films were higher than those for DC-sputtered films. Corrosion-resistance tests in a 5% sodium spray test showed that RF-sputtered films also had superior corrosion-resistance properties to DC-sputtered films. These mechanical and corrosion-resistance properties are strictly caused by the crystalline property and film structure of sputtered Mg-Si films. In this paper, the properties of DC- and RF- sputtered films are also discussed together with film deposition.
citation_title	Comparative Study of Mg-Si Films Deposited by DC- and RF- Glow Discharge Sputtering
citation_author	Serikawa, Tadashi
	Kawabata, Kenshi
	Kondoh, Katsuyoshi
citation_publisher	大阪大学接合科学研究所
citation_language	英語
citation_date	2007-12
citation_journal_title	Transactions of JWRI
citation_volume	36
citation_issue	2
citation_firstpage	39
citation_lastpage	43
citation_issn	03874508
citation_public_url	http://hdl.handle.net/11094/5801
citation_keywords	Glow Discharge
	Direct Current (DC-) Sputtering
	Radio Frequency (RF-) Sputtering
	Intermetallic Compound
	Magnesium Silicide (Mg2Si)
	Mg-Si Thin Films

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