Comparative Study of Mg-Si Films Deposited by DC- and RF- Glow Discharge Sputtering

Serikawa, Tadashi; Kawabata, Kenshi; Kondoh, Katsuyoshi

doi:https://doi.org/10.18910/5801

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論文情報

タイトル	Comparative Study of Mg-Si Films Deposited by DC- and RF- Glow Discharge Sputtering
著者	著者名 Serikawa, Tadashi
	NRID 1000050432422 1000050432422 著者名 Kawabata, Kenshi
	NRID 1000050345138 1000050345138 著者名 Kondoh, Katsuyoshi
キーワード等	Glow Discharge
	Direct Current (DC-) Sputtering
	Radio Frequency (RF-) Sputtering
	Intermetallic Compound
	Magnesium Silicide (Mg2Si)
	Mg-Si Thin Films
抄録	Mg-Si thin films were deposited at low substrate temperature by direct current (DC)- and radio frequency (RF)- glow discharge sputtering from targets composed of Mg and Si plates with area ratios of 25%:75% and 50%:50%. X-ray diffraction measurements clarified that films deposited by both DC- and RF- glow discharge sputtering from the target of Mg:Si =25%:75% showed the intermetallic compound magnesium silicide (Mg₂Si). Structural, mechanical, and corrosion-resistance properties of Mg-Si films deposited from the target of Mg:Si =25%:75% were examined. The films for both DC- and RF- sputtering showed stack structures consisting of crystalline Mg₂Si layers with columnar and amorphous phase layers. However, the amorphous phase layer for an RF-sputtered film was shown to be much thicker than that for the DC-sputtered film. Mechanical properties of elastic modulus and hardness measured by the nano-indentor method for RF-sputtered films were higher than those for DC-sputtered films. Corrosion-resistance tests in a 5% sodium spray test showed that RF-sputtered films also had superior corrosion-resistance properties to DC-sputtered films. These mechanical and corrosion-resistance properties are strictly caused by the crystalline property and film structure of sputtered Mg-Si films. In this paper, the properties of DC- and RF- sputtered films are also discussed together with film deposition.
出版者	大阪大学接合科学研究所
	オオサカダイガクセツゴウカガクケンキュウジョ
	Joining and Welding Research Institute, Osaka University
収録物名	Transactions of JWRI
巻	36
号	2
開始ページ	39
終了ページ	43
刊行年月	2007-12
言語	英語
ハンドルURL	https://hdl.handle.net/11094/5801
DOI	https://doi.org/10.18910/5801
PISSN	03874508
NCID	AA00867058
アクセス権	open access
出版タイプ	Version of Record
カテゴリ	紀要論文 Departmental Bulletin Paper
カテゴリ	Transactions of JWRI / Vol.36 No.2 (2007-12)

資源タイプ	紀要論文
ローカル資源タイプ	紀要論文
DCMI資源タイプ	text
DCTERMS.bibliographicCitation	Transactions of JWRI.36(2) p.39-p.43
DC.title	Comparative Study of Mg-Si Films Deposited by DC- and RF- Glow Discharge Sputtering
DC.creator	Serikawa, Tadashi
	Kawabata, Kenshi
	Kondoh, Katsuyoshi
DC.publisher	大阪大学接合科学研究所
	オオサカダイガクセツゴウカガクケンキュウジョ
	Joining and Welding Research Institute, Osaka University
DC.language' scheme='DCTERMS.RFC1766	英語
DC.type' scheme='DCTERMS.DCMIType	text
DCTERMS.issued' scheme='DCTERMS.W3CDTF	2007-12
DC.subject	Glow Discharge
	Direct Current (DC-) Sputtering
	Radio Frequency (RF-) Sputtering
	Intermetallic Compound
	Magnesium Silicide (Mg2Si)
	Mg-Si Thin Films
DCTERMS.abstract	Mg-Si thin films were deposited at low substrate temperature by direct current (DC)- and radio frequency (RF)- glow discharge sputtering from targets composed of Mg and Si plates with area ratios of 25%:75% and 50%:50%. X-ray diffraction measurements clarified that films deposited by both DC- and RF- glow discharge sputtering from the target of Mg:Si =25%:75% showed the intermetallic compound magnesium silicide (Mg₂Si). Structural, mechanical, and corrosion-resistance properties of Mg-Si films deposited from the target of Mg:Si =25%:75% were examined. The films for both DC- and RF- sputtering showed stack structures consisting of crystalline Mg₂Si layers with columnar and amorphous phase layers. However, the amorphous phase layer for an RF-sputtered film was shown to be much thicker than that for the DC-sputtered film. Mechanical properties of elastic modulus and hardness measured by the nano-indentor method for RF-sputtered films were higher than those for DC-sputtered films. Corrosion-resistance tests in a 5% sodium spray test showed that RF-sputtered films also had superior corrosion-resistance properties to DC-sputtered films. These mechanical and corrosion-resistance properties are strictly caused by the crystalline property and film structure of sputtered Mg-Si films. In this paper, the properties of DC- and RF- sputtered films are also discussed together with film deposition.
DC.identifier	10.18910/5801
DC.format	application/pdf
citation_doi	https://doi.org/10.18910/5801
citation_title	Comparative Study of Mg-Si Films Deposited by DC- and RF- Glow Discharge Sputtering
citation_author	Serikawa, Tadashi
	Kawabata, Kenshi
	Kondoh, Katsuyoshi
citation_publisher	大阪大学接合科学研究所
	オオサカダイガクセツゴウカガクケンキュウジョ
	Joining and Welding Research Institute, Osaka University
citation_language	英語
citation_date	2007-12
citation_journal_title	Transactions of JWRI
citation_volume	36
citation_issue	2
citation_firstpage	39
citation_lastpage	43
citation_public_url	https://hdl.handle.net/11094/5801
citation_doi_detail	10.18910/5801

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