Comparative Study of Mg-Si Films Deposited by DC- and RF- Glow Discharge Sputtering

Serikawa, Tadashi; Kawabata, Kenshi; Kondoh, Katsuyoshi

doi:https://doi.org/10.18910/5801

Comparative Study of Mg-Si Films Deposited by DC- and RF- Glow Discharge Sputtering

Serikawa, Tadashi; Kawabata, Kenshi; Kondoh, Katsuyoshi

Transactions of JWRI, 2007, 36(2), 39-43

アクセス数:515件（2025-07-12 22:33 集計）

固定URL: https://doi.org/10.18910/5801

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タイトル	Comparative Study of Mg-Si Films Deposited by DC- and RF- Glow Discharge Sputtering
著者	NRID 1000010345168 1000010345168 著者名 Serikawa, Tadashi
	NRID 1000050432422 1000050432422 著者名 Kawabata, Kenshi
	NRID 1000050345138 1000050345138 researchmap permalink kondoh kondoh Scopus Author ID 9942942300 9942942300 著者名 Kondoh, Katsuyoshi
キーワード等	Glow Discharge
	Direct Current (DC-) Sputtering
	Radio Frequency (RF-) Sputtering
	Intermetallic Compound
	Magnesium Silicide (Mg2Si)
	Mg-Si Thin Films
抄録	Mg-Si thin films were deposited at low substrate temperature by direct current (DC)- and radio frequency (RF)- glow discharge sputtering from targets composed of Mg and Si plates with area ratios of 25%:75% and 50%:50%. X-ray diffraction measurements clarified that films deposited by both DC- and RF- glow discharge sputtering from the target of Mg:Si =25%:75% showed the intermetallic compound magnesium silicide (Mg₂Si). Structural, mechanical, and corrosion-resistance properties of Mg-Si films deposited from the target of Mg:Si =25%:75% were examined. The films for both DC- and RF- sputtering showed stack structures consisting of crystalline Mg₂Si layers with columnar and amorphous phase layers. However, the amorphous phase layer for an RF-sputtered film was shown to be much thicker than that for the DC-sputtered film. Mechanical properties of elastic modulus and hardness measured by the nano-indentor method for RF-sputtered films were higher than those for DC-sputtered films. Corrosion-resistance tests in a 5% sodium spray test showed that RF-sputtered films also had superior corrosion-resistance properties to DC-sputtered films. These mechanical and corrosion-resistance properties are strictly caused by the crystalline property and film structure of sputtered Mg-Si films. In this paper, the properties of DC- and RF- sputtered films are also discussed together with film deposition.
出版者	大阪大学接合科学研究所
	オオサカダイガクセツゴウカガクケンキュウジョ
	Joining and Welding Research Institute, Osaka University
収録物名	Transactions of JWRI
巻(号)	36(2)
ページ	39-43
刊行年月	2007-12
言語	英語
ハンドルURL	https://hdl.handle.net/11094/5801
DOI	https://doi.org/10.18910/5801
PISSN	03874508
NCID	AA00867058
アクセス権	open access
出版タイプ	Version of Record
カテゴリ	紀要論文 Departmental Bulletin Paper
カテゴリ	Transactions of JWRI / Vol.36 No.2 (2007-12)

資源タイプ	紀要論文
ローカル資源タイプ	紀要論文
DCMI資源タイプ	text
DCTERMS.bibliographicCitation	Transactions of JWRI. 2007, 36(2), p. 39-43
DC.title	Comparative Study of Mg-Si Films Deposited by DC- and RF- Glow Discharge Sputtering
DC.creator	Serikawa, Tadashi
	Kawabata, Kenshi
	Kondoh, Katsuyoshi
DC.publisher	大阪大学接合科学研究所
	オオサカダイガクセツゴウカガクケンキュウジョ
	Joining and Welding Research Institute, Osaka University
DC.language' scheme='DCTERMS.RFC1766	英語
DC.type' scheme='DCTERMS.DCMIType	text
DCTERMS.issued' scheme='DCTERMS.W3CDTF	2007-12
DC.subject	Glow Discharge
	Direct Current (DC-) Sputtering
	Radio Frequency (RF-) Sputtering
	Intermetallic Compound
	Magnesium Silicide (Mg2Si)
	Mg-Si Thin Films
DCTERMS.abstract	Mg-Si thin films were deposited at low substrate temperature by direct current (DC)- and radio frequency (RF)- glow discharge sputtering from targets composed of Mg and Si plates with area ratios of 25%:75% and 50%:50%. X-ray diffraction measurements clarified that films deposited by both DC- and RF- glow discharge sputtering from the target of Mg:Si =25%:75% showed the intermetallic compound magnesium silicide (Mg₂Si). Structural, mechanical, and corrosion-resistance properties of Mg-Si films deposited from the target of Mg:Si =25%:75% were examined. The films for both DC- and RF- sputtering showed stack structures consisting of crystalline Mg₂Si layers with columnar and amorphous phase layers. However, the amorphous phase layer for an RF-sputtered film was shown to be much thicker than that for the DC-sputtered film. Mechanical properties of elastic modulus and hardness measured by the nano-indentor method for RF-sputtered films were higher than those for DC-sputtered films. Corrosion-resistance tests in a 5% sodium spray test showed that RF-sputtered films also had superior corrosion-resistance properties to DC-sputtered films. These mechanical and corrosion-resistance properties are strictly caused by the crystalline property and film structure of sputtered Mg-Si films. In this paper, the properties of DC- and RF- sputtered films are also discussed together with film deposition.
DC.identifier	10.18910/5801
DC.format	5801
citation_title	Comparative Study of Mg-Si Films Deposited by DC- and RF- Glow Discharge Sputtering
citation_author	Serikawa, Tadashi
	Kawabata, Kenshi
	Kondoh, Katsuyoshi
citation_publisher	大阪大学接合科学研究所
citation_language	英語
citation_date	2007-12
citation_journal_title	Transactions of JWRI
citation_volume	36
citation_issue	2
citation_firstpage	39
citation_lastpage	43
citation_public_url	https://hdl.handle.net/11094/5801
citation_doi_detail	10.18910/5801
citation_doi	https://doi.org/10.18910/5801

Comparative Study of Mg-Si Films Deposited by DC- and RF- Glow Discharge Sputtering

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