Fast recovery of elastic stiffness in Ag thin film studied by resonant-ultrasound spectroscopy

Nakamura, Nobutomo; Nakashima, Takeo; Ogi, Hirotsugu; Hirao, Masahiko; Nishiyama, Masayoshi

doi:https://doi.org/10.1143/JJAP.48.07GA02

Fast recovery of elastic stiffness in Ag thin film studied by resonant-ultrasound spectroscopy

Nakamura, Nobutomo; Nakashima, Takeo; Ogi, Hirotsugu et al.

Japanese Journal of Applied Physics, 2009, 48, 07GA02

アクセス数:339件（2025-07-30 14:21 集計）

固定URL: https://hdl.handle.net/11094/84480

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タイトル	Fast recovery of elastic stiffness in Ag thin film studied by resonant-ultrasound spectroscopy
著者	NRID 1000050452404 1000050452404 researchmap permalink nnakamura nnakamura Scopus Author ID 7403356186 7403356186 ORCID 0000-0002-5338-842X 0000-0002-5338-842X 著者名 Nakamura, Nobutomo
	著者名 Nakashima, Takeo
	NRID 1000090252626 1000090252626 researchmap permalink read0042771 read0042771 Scopus Author ID 35563683500 35563683500 著者名 Ogi, Hirotsugu
	NRID 1000080112027 1000080112027 著者名 Hirao, Masahiko
	著者名 Nishiyama, Masayoshi
内容	Nobutomo Nakamura, Takeo Nakashima, Hirotsugu Ogi, Masahiko Hirao and Masayoshi Nishiyama. Fast recovery of elastic stiffness in Ag thin film studied by resonant-ultrasound spectroscopy. Japanese Journal of Applied Physics, 2009, 48(7S), 07GA02. https://doi.org/10.1143/JJAP.48.07GA02.
抄録	We studied the recovery of the elastic constant of sputtered Ag films on monocrystal Si substrates by monitoring the resonance frequency of film/substrate specimens throughout the deposition process using resonant-ultrasound spectroscopy. An Ag film is deposited on a (001) Si substrate, which is located on the tripod transducer set in the sputtering chamber. The free-vibration resonance frequency of the Ag/Si specimen is measured before, during, and after the magnetron sputtering deposition, inducing the evolution of the elastic constants of the deposited film. Recovery of the elastic constants of the Ag film is completed within 40 min. The recovery behavior of the elastic constants is similar to that of residual stress; the recovery rate is comparable to that for residual stress.
出版者	The Japan Society of Applied Physics
収録物名	Japanese Journal of Applied Physics
巻(号)	48
ページ	07GA02
刊行年月	2009-07-21
言語	英語
ハンドルURL	https://hdl.handle.net/11094/84480
PISSN	00214922
eISSN	13474065
NCID	AA12295836
関連情報 (isVersionOf)	DOI (出版社版) https://doi.org/10.1143/JJAP.48.07GA02
アクセス権	open access
出版タイプ	Accepted Manuscript
カテゴリ	学術雑誌論文 Journal Article

資源タイプ	学術雑誌論文
ローカル資源タイプ	学術雑誌論文
DCMI資源タイプ	text
DCTERMS.bibliographicCitation	Japanese Journal of Applied Physics. 2009, 48, p. 07GA02
DC.title	Fast recovery of elastic stiffness in Ag thin film studied by resonant-ultrasound spectroscopy
DC.creator	Nakamura, Nobutomo
	Nakashima, Takeo
	Ogi, Hirotsugu
	Hirao, Masahiko
	Nishiyama, Masayoshi
DC.publisher	The Japan Society of Applied Physics
DC.language' scheme='DCTERMS.RFC1766	英語
DC.type' scheme='DCTERMS.DCMIType	text
DCTERMS.issued' scheme='DCTERMS.W3CDTF	2009-07-21
DC.identifier	https://doi.org/10.1143/JJAP.48.07GA02
DC.description	Nobutomo Nakamura, Takeo Nakashima, Hirotsugu Ogi, Masahiko Hirao and Masayoshi Nishiyama. Fast recovery of elastic stiffness in Ag thin film studied by resonant-ultrasound spectroscopy. Japanese Journal of Applied Physics, 2009, 48(7S), 07GA02. https://doi.org/10.1143/JJAP.48.07GA02.
DCTERMS.abstract	We studied the recovery of the elastic constant of sputtered Ag films on monocrystal Si substrates by monitoring the resonance frequency of film/substrate specimens throughout the deposition process using resonant-ultrasound spectroscopy. An Ag film is deposited on a (001) Si substrate, which is located on the tripod transducer set in the sputtering chamber. The free-vibration resonance frequency of the Ag/Si specimen is measured before, during, and after the magnetron sputtering deposition, inducing the evolution of the elastic constants of the deposited film. Recovery of the elastic constants of the Ag film is completed within 40 min. The recovery behavior of the elastic constants is similar to that of residual stress; the recovery rate is comparable to that for residual stress.
DC.format	84480
citation_title	Fast recovery of elastic stiffness in Ag thin film studied by resonant-ultrasound spectroscopy
citation_author	Nakamura, Nobutomo
	Nakashima, Takeo
	Ogi, Hirotsugu
	Hirao, Masahiko
	Nishiyama, Masayoshi
citation_publisher	The Japan Society of Applied Physics
citation_language	英語
citation_date	2009-07-21
citation_journal_title	Japanese Journal of Applied Physics
citation_volume	48
citation_firstpage	07GA02
citation_doi	https://doi.org/10.1143/JJAP.48.07GA02
citation_public_url	https://hdl.handle.net/11094/84480

Fast recovery of elastic stiffness in Ag thin film studied by resonant-ultrasound spectroscopy

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