Nearly diffraction-limited line focusing of a hard-X-ray beam with an elliptically figured mirror

Yamauchi, Kazuto; Yamamura, Kazuya; Mimura, Hidekazu; Sano, Yasuhisa; Saito, Akira; Souvorov, Alexei; Yabashi, Makina; Tamasaku, Kenji; Ishikawa, Tetsuya; Mori, Yuzo

doi:https://doi.org/10.1107/S0909049502012578

Nearly diffraction-limited line focusing of a hard-X-ray beam with an elliptically figured mirror

Yamauchi, Kazuto; Yamamura, Kazuya; Mimura, Hidekazu et al.

Journal of Synchrotron Radiation, 2002, 9(5), 313-316

アクセス数:985件（2025-07-23 11:35 集計）

固定URL: https://hdl.handle.net/11094/85462

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タイトル	Nearly diffraction-limited line focusing of a hard-X-ray beam with an elliptically figured mirror
著者	NRID 1000010174575 1000010174575 researchmap permalink yamauchikazuto yamauchikazuto Scopus Author ID 7801509680 7801509680 著者名 Yamauchi, Kazuto
	NRID 1000060240074 1000060240074 researchmap permalink read0014013 read0014013 Scopus Author ID 7201754767 7201754767 著者名 Yamamura, Kazuya
	NRID 1000030362651 1000030362651 著者名 Mimura, Hidekazu
	NRID 1000040252598 1000040252598 ORCID 0000-0002-1767-922X 0000-0002-1767-922X researchmap permalink read0042804 read0042804 Scopus Author ID 7402344818 7402344818 著者名 Sano, Yasuhisa
	NRID 1000090294024 1000090294024 ORCID 0000-0003-3859-5575 0000-0003-3859-5575 researchmap permalink nyudo nyudo Scopus Author ID 55725475700 55725475700 著者名 Saito, Akira
	著者名 Souvorov, Alexei
	NRID 1000000372144 1000000372144 著者名 Yabashi, Makina
	NRID 1000030300883 1000030300883 著者名 Tamasaku, Kenji
	NRID 1000080159699 1000080159699 著者名 Ishikawa, Tetsuya
	NRID 1000000029125 1000000029125 著者名 Mori, Yuzo
キーワード等	elastic emission machining
	plasma chemical vaporization machining
	coherent X-rays
	submicrometre focusing
	elliptical mirrors
内容	Yamauchi, K., Yamamura, K., Mimura, H., Sano, Y., Saito, A., Souvorov, A., Yabashi, M., Tamasaku, K., Ishikawa, T. & Mori, Y. (2002). J. Synchrotron Rad. 9, 313-316.
抄録	An elliptical mirror for X-ray microfocusing was manufactured using the new fabrication methods of elastic emission machining and plasma chemical vaporization machining. Surface profiles measured using stitching interferometry showed a maximum deviation around the ideal figure of 7 nm peak-to-valley. The mirror showed nearly diffraction-limited focusing performance, with a 200 nm line width at the focus. Wave-optical calculations, taking the measured surface profile into consideration, reproduced well the measured focusing properties both at and around the beam waist.
出版者	International Union of Crystallography
収録物名	Journal of Synchrotron Radiation
巻(号)	9(5)
ページ	313-316
刊行年月	2002-09
言語	英語
ハンドルURL	https://hdl.handle.net/11094/85462
PISSN	09090495
NCID	AA11022317
関連情報 (isIdenticalTo)	DOI (出版社版) https://doi.org/10.1107/S0909049502012578
関連情報 (isIdenticalTo)	PMID 12200576
アクセス権	open access
権利情報	© International Union of Crystallography
出版タイプ	Version of Record
カテゴリ	学術雑誌論文 Journal Article

資源タイプ	学術雑誌論文
ローカル資源タイプ	学術雑誌論文
DCMI資源タイプ	text
DCTERMS.bibliographicCitation	Journal of Synchrotron Radiation. 2002, 9(5), p. 313-316
DC.title	Nearly diffraction-limited line focusing of a hard-X-ray beam with an elliptically figured mirror
DC.creator	Yamauchi, Kazuto
	Yamamura, Kazuya
	Mimura, Hidekazu
	Sano, Yasuhisa
	Saito, Akira
	Souvorov, Alexei
	Yabashi, Makina
	Tamasaku, Kenji
	Ishikawa, Tetsuya
	Mori, Yuzo
DC.publisher	International Union of Crystallography
DC.language' scheme='DCTERMS.RFC1766	英語
DC.type' scheme='DCTERMS.DCMIType	text
DCTERMS.issued' scheme='DCTERMS.W3CDTF	2002-09
DC.identifier	https://doi.org/10.1107/S0909049502012578
DC.subject	elastic emission machining
	plasma chemical vaporization machining
	coherent X-rays
	submicrometre focusing
	elliptical mirrors
DC.description	Yamauchi, K., Yamamura, K., Mimura, H., Sano, Y., Saito, A., Souvorov, A., Yabashi, M., Tamasaku, K., Ishikawa, T. & Mori, Y. (2002). J. Synchrotron Rad. 9, 313-316.
DCTERMS.abstract	An elliptical mirror for X-ray microfocusing was manufactured using the new fabrication methods of elastic emission machining and plasma chemical vaporization machining. Surface profiles measured using stitching interferometry showed a maximum deviation around the ideal figure of 7 nm peak-to-valley. The mirror showed nearly diffraction-limited focusing performance, with a 200 nm line width at the focus. Wave-optical calculations, taking the measured surface profile into consideration, reproduced well the measured focusing properties both at and around the beam waist.
DC.rights	© International Union of Crystallography
DC.format	85462
citation_title	Nearly diffraction-limited line focusing of a hard-X-ray beam with an elliptically figured mirror
citation_author	Yamauchi, Kazuto
	Yamamura, Kazuya
	Mimura, Hidekazu
	Sano, Yasuhisa
	Saito, Akira
	Souvorov, Alexei
	Yabashi, Makina
	Tamasaku, Kenji
	Ishikawa, Tetsuya
	Mori, Yuzo
citation_publisher	International Union of Crystallography
citation_language	英語
citation_date	2002-09
citation_journal_title	Journal of Synchrotron Radiation
citation_volume	9
citation_issue	5
citation_firstpage	313
citation_lastpage	316
citation_doi	https://doi.org/10.1107/S0909049502012578
citation_pmid	12200576
citation_public_url	https://hdl.handle.net/11094/85462

Nearly diffraction-limited line focusing of a hard-X-ray beam with an elliptically figured mirror

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