学術雑誌論文

学術雑誌論文

text

Review of Scientific Instruments. 2003, 74(10), p. 4549-4553

Fabrication of elliptical mirror at nanometer-level accuracy for hard x-ray focusing by numerically controlled plasma chemical vaporization machining

AIP Publishing

英語

text

2003-10

https://doi.org/10.1063/1.1606531

Kazuya Yamamura, Kazuto Yamauchi, Hidekazu Mimura, Yasuhisa Sano, Akira Saito, Katsuyoshi Endo, Alexei Souvorov, Makina Yabashi, Kenji Tamasaku, Tetsuya Ishikawa and Yuzo Mori, "Fabrication of elliptical mirror at nanometer-level accuracy for hard x-ray focusing by numerically controlled plasma chemical vaporization machining", Review of Scientific Instruments 74, 4549-4553 (2003) https://doi.org/10.1063/1.1606531.

We established an efficient ultraprecise figuring process in which numerically controlled plasma chemical vaporization machining (NC-PCVM) and numerically controlled elastic emission machining (NC-EEM) are utilized serially. Intensity images of the x rays reflected by total reflection mirrors greatly fluctuate with respect to the figure error of spatial wavelength ranging from submillimeter to 10 mm. In NC-PCVM, figure errors for spatial wavelength range longer than 10 mm are removed efficiently by using the rotary electrode, and the spatial wavelength close to 1 mm can be corrected by using the pipe electrode. The residual figure error for the spatial wavelength close to 0.1 mm is finally removed by EEM. In this article, we describe the ultraprecise figuring process utilizing the NC-PCVM. Two elliptical mirrors for a Kirkpatrick–Baez (KB) microfocusing unit were manufactured by NC-PCVM using the rotary electrode and the pipe electrode in combination, and a figure accuracy higher than 3 nm (p–v) was achieved for the spatial wavelength range longer than 1 mm. The focusing properties of the two mirrors were evaluated at BL29XUL of SPring-8, and line focusing widths of 0.12 and 0.2 μm (full width at half maximum) were achieved at 15 keV.

This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. This article appeared in Review of Scientific Instruments and may be found at https://doi.org/10.1063/1.1606531.

85464

Fabrication of elliptical mirror at nanometer-level accuracy for hard x-ray focusing by numerically controlled plasma chemical vaporization machining

AIP Publishing

英語

2003-10

Review of Scientific Instruments

74

10

4549

4553

https://doi.org/10.1063/1.1606531

https://hdl.handle.net/11094/85464