学術雑誌論文

学術雑誌論文

text

Review of Scientific Instruments. 2016, 87(6), p. 063118

Development of speckle-free channel-cut crystal optics using plasma chemical vaporization machining for coherent x-ray applications

American Institute of Physics

英語

text

2016-06

https://doi.org/10.1063/1.4954731

Takashi Hirano, Taito Osaka, Yasuhisa Sano, Yuichi Inubushi, Satoshi Matsuyama, Kensuke Tono, Tetsuya Ishikawa, Makina Yabashi, and Kazuto Yamauchi, "Development of speckle-free channel-cut crystal optics using plasma chemical vaporization machining for coherent x-ray applications", Review of Scientific Instruments 87, 063118 (2016) https://doi.org/10.1063/1.4954731.

We have developed a method of fabricating speckle-free channel-cut crystal optics with plasma chemical vaporization machining, an etching method using atmospheric-pressure plasma, for coherent X-ray applications. We investigated the etching characteristics to silicon crystals and achieved a small surface roughness of less than 1 nm rms at a removal depth of >10 μm, which satisfies the requirements for eliminating subsurface damage while suppressing diffuse scattering from rough surfaces. We applied this method for fabricating channel-cut Si(220) crystals for a hard X-ray split-and-delay optical system and confirmed that the crystals provided speckle-free reflection profiles under coherent X-ray illumination.

This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. This article appeared in (citation of published article) and may be found at https://doi.org/10.1063/1.4954731.

86949

Development of speckle-free channel-cut crystal optics using plasma chemical vaporization machining for coherent x-ray applications

American Institute of Physics

英語

2016-06

Review of Scientific Instruments

87

6

063118

https://doi.org/10.1063/1.4954731

https://hdl.handle.net/11094/86949