学術雑誌論文

学術雑誌論文

text

Review of Scientific Instruments. 2019, 90(4), p. 045115

Catalyzed chemical polishing of SiO2 glasses in pure water

American Institute of Physics

英語

text

2019-04-15

https://doi.org/10.1063/1.5090320

Daisetsu Toh, Pho Van Bui, Ai Isohashi, Naotaka Kidani, Satoshi Matsuyama, Yasuhisa Sano, Yoshitada Morikawa, and Kazuto Yamauchi, "Catalyzed chemical polishing of SiO2 glasses in pure water", Review of Scientific Instruments 90, 045115 (2019), https://doi.org/10.1063/1.5090320.

A catalytically assisted etching system was developed for the ultra-precision fabrication of optical components, such as X-ray mirrors and extreme-ultraviolet mask blanks. This study demonstrates that an atomically smooth surface with a sub-Angstrom root-mean-square roughness could be achieved on a SiO2 glass substrate using pure water and Pt as the etching solution and catalyst, respectively. Density functional theory calculations confirmed that the mechanistic pathway was involved in catalyzed hydrolysis. The significant roles of the catalyst were clarified to be the dissociation of water molecules and the stabilization of a meta-stable state, in which a hypervalent silicate state is induced, and the Si-O backbond is elongated and loosened. To confirm the role of the catalyst, the Pt metal was replaced by Au, and the observed drastic difference in the removal rate was attributed to the degree of stabilization of the metastable state.

This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. This article appeared in (citation of published article) and may be found at https://doi.org/10.1063/1.5090320.

86963

Catalyzed chemical polishing of SiO2 glasses in pure water

American Institute of Physics

英語

2019-04-15

Review of Scientific Instruments

90

4

045115

https://doi.org/10.1063/1.5090320

31043040

https://hdl.handle.net/11094/86963