学術雑誌論文

学術雑誌論文

text

Review of Scientific Instruments. 2005, 76(8), p. 083114

Diffraction-limited two-dimensional hard-x-ray focusing at the 100 nm level using a Kirkpatrick-Baez mirror arrangement

American Institute of Physics

英語

text

2005-08-04

https://doi.org/10.1063/1.2005427

S. Matsuyama, H. Mimura, et al. "Diffraction-limited two-dimensional hard-x-ray focusing at the 100nm level using a Kirkpatrick-Baez mirror arrangement", Review of Scientific Instruments 76(8), 083114 (2005) https://doi.org/10.1063/1.2005427.

The spatial resolution of scanning x-ray microscopy depends on the beam size of focused x rays. Recently, nearly diffraction-limited line focusing has been achieved using elliptical mirror optics at the 100 nm level. To realize such focusing two-dimensionally in a Kirkpatrick-Baez system, the required accuracies of the mirror aligners in this system were estimated using optical simulators based on geometrical or wave-optical theories. A focusing unit fulfilling the required adjustment accuracies was constructed. The relationships between alignment errors and focused beam profiles were quantitatively examined at the 1 km long beamline (BL29XUL) of SPring-8 to be in good agreement with the simulation results. © 2005 American Institute of Physics.

This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. This article appeared in Review of Scientific Instruments 76(8), 083114 (2005) and may be found at https://doi.org/10.1063/1.2005427.

86969

Diffraction-limited two-dimensional hard-x-ray focusing at the 100 nm level using a Kirkpatrick-Baez mirror arrangement

American Institute of Physics

英語

2005-08-04

Review of Scientific Instruments

76

8

083114

https://doi.org/10.1063/1.2005427

https://hdl.handle.net/11094/86969