High-resolution projection image reconstruction of thick objects by hard x-ray diffraction microscopy

Takahashi, Yukio; Nishino, Yoshinori; Tsutsumi, Ryosuke; Zettsu, Nobuyuki; Matsubara, Eiichiro; Yamauchi, Kazuto; Ishikawa, Tetsuya

doi:https://doi.org/10.1103/PhysRevB.82.214102

High-resolution projection image reconstruction of thick objects by hard x-ray diffraction microscopy

Takahashi, Yukio; Nishino, Yoshinori; Tsutsumi, Ryosuke et al.

Physical Review B - Condensed Matter and Materials Physics, 2010, 82(21), 214102

アクセス数:177件（2025-05-16 05:00 集計）

固定URL: https://hdl.handle.net/11094/86983

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タイトル	High-resolution projection image reconstruction of thick objects by hard x-ray diffraction microscopy
著者	NRID 1000000415217 1000000415217 著者名 Takahashi, Yukio
	NRID 1000040392063 1000040392063 著者名 Nishino, Yoshinori
	著者名 Tsutsumi, Ryosuke
	NRID 1000010432519 1000010432519 著者名 Zettsu, Nobuyuki
	NRID 1000090173864 1000090173864 著者名 Matsubara, Eiichiro
	NRID 1000010174575 1000010174575 researchmap permalink yamauchikazuto yamauchikazuto Scopus Author ID 7801509680 7801509680 著者名 Yamauchi, Kazuto
	NRID 1000080159699 1000080159699 著者名 Ishikawa, Tetsuya
内容	Yukio Takahashi, Yoshinori Nishino, Ryosuke Tsutsumi, Nobuyuki Zettsu, Eiichiro Matsubara, Kazuto Yamauchi, and Tetsuya Ishikawa. Phys. Rev. B 82(21), 214102 (2010).
抄録	Hard x-ray diffraction microscopy enables us to observe thick objects at high spatial resolution. The resolution of this method is limited, in principle, by only the x-ray wavelength and the largest scattering angle recorded. As the resolution approaches the wavelength, the thickness effect of objects plays a significant role in x-ray diffraction microscopy. In this paper, we report high-resolution hard x-ray diffraction microscopy for thick objects. We used highly focused coherent x rays with a wavelength of ∼0.1 nm as an incident beam and measured the diffraction patterns of a ∼150-nm -thick silver nanocube at the scattering angle of ∼3°. We observed a characteristic contrast of the coherent diffraction pattern due to only the thickness effect and collected the diffraction patterns at nine incident angles so as to obtain information on a cross section of Fourier space. We reconstructed a pure projection image by the iterative phasing method from the patched diffraction pattern. The edge resolution of the reconstructed image was ∼2 nm, which was the highest resolution so far achieved by x-ray microscopy. The present study provides us with a method for quantitatively observing thick samples at high resolution by hard x-ray diffraction microscopy. © 2010 The American Physical Society.
出版者	American Physical Society (APS)
収録物名	Physical Review B - Condensed Matter and Materials Physics
巻(号)	82(21)
ページ	214102
刊行年月	2010-12-02
言語	英語
ハンドルURL	https://hdl.handle.net/11094/86983
PISSN	10980121
eISSN	1550235X
NCID	AA11187113
関連情報 (isIdenticalTo)	DOI (出版社版) https://doi.org/10.1103/PhysRevB.82.214102
アクセス権	open access
権利情報	Copyright 2010 by the American Physical Society
出版タイプ	Version of Record
カテゴリ	学術雑誌論文 Journal Article

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資源タイプ	学術雑誌論文
ローカル資源タイプ	学術雑誌論文
DCMI資源タイプ	text
DCTERMS.bibliographicCitation	Physical Review B - Condensed Matter and Materials Physics. 2010, 82(21), p. 214102
DC.title	High-resolution projection image reconstruction of thick objects by hard x-ray diffraction microscopy
DC.creator	Takahashi, Yukio
	Nishino, Yoshinori
	Tsutsumi, Ryosuke
	Zettsu, Nobuyuki
	Matsubara, Eiichiro
	Yamauchi, Kazuto
	Ishikawa, Tetsuya
DC.publisher	American Physical Society (APS)
DC.language' scheme='DCTERMS.RFC1766	英語
DC.type' scheme='DCTERMS.DCMIType	text
DCTERMS.issued' scheme='DCTERMS.W3CDTF	2010-12-02
DC.identifier	https://doi.org/10.1103/PhysRevB.82.214102
DC.description	Yukio Takahashi, Yoshinori Nishino, Ryosuke Tsutsumi, Nobuyuki Zettsu, Eiichiro Matsubara, Kazuto Yamauchi, and Tetsuya Ishikawa. Phys. Rev. B 82(21), 214102 (2010).
DCTERMS.abstract	Hard x-ray diffraction microscopy enables us to observe thick objects at high spatial resolution. The resolution of this method is limited, in principle, by only the x-ray wavelength and the largest scattering angle recorded. As the resolution approaches the wavelength, the thickness effect of objects plays a significant role in x-ray diffraction microscopy. In this paper, we report high-resolution hard x-ray diffraction microscopy for thick objects. We used highly focused coherent x rays with a wavelength of ∼0.1 nm as an incident beam and measured the diffraction patterns of a ∼150-nm -thick silver nanocube at the scattering angle of ∼3°. We observed a characteristic contrast of the coherent diffraction pattern due to only the thickness effect and collected the diffraction patterns at nine incident angles so as to obtain information on a cross section of Fourier space. We reconstructed a pure projection image by the iterative phasing method from the patched diffraction pattern. The edge resolution of the reconstructed image was ∼2 nm, which was the highest resolution so far achieved by x-ray microscopy. The present study provides us with a method for quantitatively observing thick samples at high resolution by hard x-ray diffraction microscopy. © 2010 The American Physical Society.
DC.rights	Copyright 2010 by the American Physical Society
DC.format	86983
citation_title	High-resolution projection image reconstruction of thick objects by hard x-ray diffraction microscopy
citation_author	Takahashi, Yukio
	Nishino, Yoshinori
	Tsutsumi, Ryosuke
	Zettsu, Nobuyuki
	Matsubara, Eiichiro
	Yamauchi, Kazuto
	Ishikawa, Tetsuya
citation_publisher	American Physical Society (APS)
citation_language	英語
citation_date	2010-12-02
citation_journal_title	Physical Review B - Condensed Matter and Materials Physics
citation_volume	82
citation_issue	21
citation_firstpage	214102
citation_doi	https://doi.org/10.1103/PhysRevB.82.214102
citation_public_url	https://hdl.handle.net/11094/86983