Damage to inorganic materials illuminated by focused beam of X-ray free-electron laser radiation

Koyama, Takahisa; Yumoto, Hirokatsu; Tono, Kensuke; Togashi, Tadashi; Inubushi, Yuichi; Katayama, Tetsuo; Kim, Jangwoo; Matsuyama, Satoshi; Yabashi, Makina; Yamauchi, Kazuto; Ohashi, Haruhiko

doi:https://doi.org/10.1117/12.2182778

Damage to inorganic materials illuminated by focused beam of X-ray free-electron laser radiation

Koyama, Takahisa; Yumoto, Hirokatsu; Tono, Kensuke et al.

Proceedings of SPIE, 2015, 9511, 951107

アクセス数:1,131件（2025-10-11 16:21 集計）

固定URL: https://hdl.handle.net/11094/87561

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タイトル	Damage to inorganic materials illuminated by focused beam of X-ray free-electron laser radiation
著者	NRID 1000020468276 1000020468276 著者名 Koyama, Takahisa
	NRID 1000020423197 1000020423197 著者名 Yumoto, Hirokatsu
	NRID 1000000353508 1000000353508 著者名 Tono, Kensuke
	NRID 1000060415239 1000060415239 著者名 Togashi, Tadashi
	NRID 1000040506250 1000040506250 著者名 Inubushi, Yuichi
	NRID 1000090648073 1000090648073 著者名 Katayama, Tetsuo
	著者名 Kim, Jangwoo
	NRID 1000010423196 1000010423196 著者名 Matsuyama, Satoshi
	NRID 1000000372144 1000000372144 著者名 Yabashi, Makina
	NRID 1000010174575 1000010174575 researchmap permalink yamauchikazuto yamauchikazuto Scopus Author ID 7801509680 7801509680 著者名 Yamauchi, Kazuto
	NRID 1000030443550 1000030443550 著者名 Ohashi, Haruhiko
キーワード等	Ablation
	Damage threshold
	Focused beam
	Hard X-ray
	Thin film coating
	X-ray free-electron laser
	X-ray mirror
内容	Takahisa Koyama, Hirokatsu Yumoto, Kensuke Tono, Tadashi Togashi, Yuichi Inubushi, Tetsuo Katayama, Jangwoo Kim, Satoshi Matsuyama, Makina Yabashi, Kazuto Yamauchi, and Haruhiko Ohashi "Damage to inorganic materials illuminated by focused beam of x-ray free-electron laser radiation", Proc. SPIE 9511, Damage to VUV, EUV, and X-ray Optics V, 951107 (12 May 2015); https://doi.org/10.1117/12.2182778
抄録	X-ray free-electron lasers (XFELs) that utilize intense and ultra-short pulse X-rays may damage optical elements. We investigated the damage fluence thresholds of optical materials by using an XFEL focusing beam that had a power density sufficient to induce ablation phenomena. The 1 μ4m focusing beams with 5.5 keV and/or 10 keV photon energies were produced at the XFEL facility SACLA (SPring-8 Angstrom Compact free electron LAser). Test samples were irradiated with the focusing beams under normal and/or grazing incidence conditions. The samples were uncoated Si, synthetic silica glass (SiO2), and metal (Rh, Pt)-coated substrates, which are often used as X-ray mirror materials.
出版者	The International Society for Optical Engineering
収録物名	Proceedings of SPIE
巻(号)	9511
ページ	951107
刊行年月	2015-05-12
言語	英語
ハンドルURL	https://hdl.handle.net/11094/87561
PISSN	0277786X
eISSN	1996756X
NCID	AA10619755
関連情報 (isIdenticalTo)	DOI (出版社版) https://doi.org/10.1117/12.2182778
関連情報 (isIdenticalTo)	NCID BA0022700X
アクセス権	open access
権利情報	Copyright 2015 SPIE. One print or electronic copy may be made for personal use only. Systematic reproduction and distribution, duplication of any material in this publication for a fee or for commercial purposes, or modification of the contents of the publication are prohibited.
出版タイプ	Version of Record
カテゴリ	会議発表論文 Conference Paper

資源タイプ	会議発表論文
ローカル資源タイプ	会議発表論文
DCMI資源タイプ	text
DCTERMS.bibliographicCitation	Proceedings of SPIE. 2015, 9511, p. 951107
DC.title	Damage to inorganic materials illuminated by focused beam of X-ray free-electron laser radiation
DC.creator	Koyama, Takahisa
	Yumoto, Hirokatsu
	Tono, Kensuke
	Togashi, Tadashi
	Inubushi, Yuichi
	Katayama, Tetsuo
	Kim, Jangwoo
	Matsuyama, Satoshi
	Yabashi, Makina
	Yamauchi, Kazuto
	Ohashi, Haruhiko
DC.publisher	The International Society for Optical Engineering
DC.language' scheme='DCTERMS.RFC1766	英語
DC.type' scheme='DCTERMS.DCMIType	text
DCTERMS.issued' scheme='DCTERMS.W3CDTF	2015-05-12
DC.identifier	https://doi.org/10.1117/12.2182778
DC.subject	Ablation
	Damage threshold
	Focused beam
	Hard X-ray
	Thin film coating
	X-ray free-electron laser
	X-ray mirror
DC.description	Takahisa Koyama, Hirokatsu Yumoto, Kensuke Tono, Tadashi Togashi, Yuichi Inubushi, Tetsuo Katayama, Jangwoo Kim, Satoshi Matsuyama, Makina Yabashi, Kazuto Yamauchi, and Haruhiko Ohashi "Damage to inorganic materials illuminated by focused beam of x-ray free-electron laser radiation", Proc. SPIE 9511, Damage to VUV, EUV, and X-ray Optics V, 951107 (12 May 2015); https://doi.org/10.1117/12.2182778
DCTERMS.abstract	X-ray free-electron lasers (XFELs) that utilize intense and ultra-short pulse X-rays may damage optical elements. We investigated the damage fluence thresholds of optical materials by using an XFEL focusing beam that had a power density sufficient to induce ablation phenomena. The 1 μ4m focusing beams with 5.5 keV and/or 10 keV photon energies were produced at the XFEL facility SACLA (SPring-8 Angstrom Compact free electron LAser). Test samples were irradiated with the focusing beams under normal and/or grazing incidence conditions. The samples were uncoated Si, synthetic silica glass (SiO2), and metal (Rh, Pt)-coated substrates, which are often used as X-ray mirror materials.
DC.rights	Copyright 2015 SPIE. One print or electronic copy may be made for personal use only. Systematic reproduction and distribution, duplication of any material in this publication for a fee or for commercial purposes, or modification of the contents of the publication are prohibited.
DC.format	87561
citation_title	Damage to inorganic materials illuminated by focused beam of X-ray free-electron laser radiation
citation_author	Koyama, Takahisa
	Yumoto, Hirokatsu
	Tono, Kensuke
	Togashi, Tadashi
	Inubushi, Yuichi
	Katayama, Tetsuo
	Kim, Jangwoo
	Matsuyama, Satoshi
	Yabashi, Makina
	Yamauchi, Kazuto
	Ohashi, Haruhiko
citation_publisher	The International Society for Optical Engineering
citation_language	英語
citation_date	2015-05-12
citation_journal_title	Proceedings of SPIE
citation_volume	9511
citation_firstpage	951107
citation_doi	https://doi.org/10.1117/12.2182778
citation_public_url	https://hdl.handle.net/11094/87561

Damage to inorganic materials illuminated by focused beam of X-ray free-electron laser radiation

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