Deposition of germanium dioxide films by the injection of oxygen ion beam in conjunction with hexamethyldigermane

Yoshimura, Satoru; Sugimoto, Satoshi; Takeuchi, Takae; Murai, Kensuke; Kiuchi, Masato

doi:https://doi.org/10.1016/j.nima.2023.168707

Deposition of germanium dioxide films by the injection of oxygen ion beam in conjunction with hexamethyldigermane

Yoshimura, Satoru; Sugimoto, Satoshi; Takeuchi, Takae et al.

Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, 2023, 1056, 168707

アクセス数:663件（2025-08-21 12:07 集計）

固定URL: https://hdl.handle.net/11094/92841

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タイトル	Deposition of germanium dioxide films by the injection of oxygen ion beam in conjunction with hexamethyldigermane
著者	NRID 1000040294029 1000040294029 researchmap permalink read0051706 read0051706 Scopus Author ID 36093428100 36093428100 著者名 Yoshimura, Satoru
	NRID 1000070187665 1000070187665 researchmap permalink read0014151 read0014151 Scopus Author ID 55505129300 55505129300 著者名 Sugimoto, Satoshi
	NRID 1000080201606 1000080201606 著者名 Takeuchi, Takae
	NRID 1000000358144 1000000358144 著者名 Murai, Kensuke
	NRID 1000050356862 1000050356862 researchmap permalink read0005090 read0005090 著者名 Kiuchi, Masato
キーワード等	Germanium dioxide
	Hexamethyldigermane
	Ion beam induced deposition
	Oxygen ion beam
内容	Yoshimura S., Sugimoto S., Takeuchi T., et al. Deposition of germanium dioxide films by the injection of oxygen ion beam in conjunction with hexamethyldigermane. Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment 1056, 168707 (2023); https://doi.org/10.1016/j.nima.2023.168707.
抄録	We proposed a methodology for fabricating a film by the simultaneous injections of O+ ions and hexamethyldigermane (HMDG) to a substrate. The O+-ion energy was set at 50 eV. After the experimental trial, we found a film deposited on the substrate. The analyses of the film with X-ray photoelectron spectroscopy and Fourier transform infrared spectroscopy showed that the deposited film was germanium dioxide (GeO2). It was also noted that no film deposition occurred when HMDG was supplied to substrates without O+-ion beam injections. In conclusion, the low-energy O+-ion beam induced deposition using HMDG was found to be useful for the deposition of GeO2 films.
出版者	Elsevier B.V.
収録物名	Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment
巻(号)	1056
ページ	168707
刊行年月	2023-11-01
言語	英語
ハンドルURL	https://hdl.handle.net/11094/92841
PISSN	01689002
eISSN	18729576
関連情報 (isVersionOf)	DOI (出版社版) https://doi.org/10.1016/j.nima.2023.168707
アクセス権	embargoed access
権利情報	©2023. This manuscript version is made available under the CC-BY-NC-ND 4.0 license
権利情報	The full-text file will be made open to the public on 1 November 2025 in accordance with the publisher's policy.
出版タイプ	Accepted Manuscript
カテゴリ	学術雑誌論文 Journal Article

資源タイプ	学術雑誌論文
ローカル資源タイプ	学術雑誌論文
DCMI資源タイプ	text
DCTERMS.bibliographicCitation	Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment. 2023, 1056, p. 168707
DC.title	Deposition of germanium dioxide films by the injection of oxygen ion beam in conjunction with hexamethyldigermane
DC.creator	Yoshimura, Satoru
	Sugimoto, Satoshi
	Takeuchi, Takae
	Murai, Kensuke
	Kiuchi, Masato
DC.publisher	Elsevier B.V.
DC.language' scheme='DCTERMS.RFC1766	英語
DC.type' scheme='DCTERMS.DCMIType	text
DCTERMS.issued' scheme='DCTERMS.W3CDTF	2023-11-01
DC.identifier	https://doi.org/10.1016/j.nima.2023.168707
DC.subject	Germanium dioxide
	Hexamethyldigermane
	Ion beam induced deposition
	Oxygen ion beam
DC.description	Yoshimura S., Sugimoto S., Takeuchi T., et al. Deposition of germanium dioxide films by the injection of oxygen ion beam in conjunction with hexamethyldigermane. Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment 1056, 168707 (2023); https://doi.org/10.1016/j.nima.2023.168707.
DCTERMS.abstract	We proposed a methodology for fabricating a film by the simultaneous injections of O+ ions and hexamethyldigermane (HMDG) to a substrate. The O+-ion energy was set at 50 eV. After the experimental trial, we found a film deposited on the substrate. The analyses of the film with X-ray photoelectron spectroscopy and Fourier transform infrared spectroscopy showed that the deposited film was germanium dioxide (GeO2). It was also noted that no film deposition occurred when HMDG was supplied to substrates without O+-ion beam injections. In conclusion, the low-energy O+-ion beam induced deposition using HMDG was found to be useful for the deposition of GeO2 films.
DC.rights	©2023. This manuscript version is made available under the CC-BY-NC-ND 4.0 license
DC.rights	The full-text file will be made open to the public on 1 November 2025 in accordance with the publisher's policy.
DC.format	92841
citation_title	Deposition of germanium dioxide films by the injection of oxygen ion beam in conjunction with hexamethyldigermane
citation_author	Yoshimura, Satoru
	Sugimoto, Satoshi
	Takeuchi, Takae
	Murai, Kensuke
	Kiuchi, Masato
citation_publisher	Elsevier B.V.
citation_language	英語
citation_date	2023-11-01
citation_journal_title	Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment
citation_volume	1056
citation_firstpage	168707
citation_doi	https://doi.org/10.1016/j.nima.2023.168707
citation_public_url	https://hdl.handle.net/11094/92841

Deposition of germanium dioxide films by the injection of oxygen ion beam in conjunction with hexamethyldigermane

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