紀要論文

紀要論文

text

Transactions of JWRI. 2008, 37(1), p. 109-112

Structures of Metallic Glass Sputtered Films by Using Zr-Al-Ni-Cu Alloy Targets

英語

text

2008-07

Zr-Al-Ni-Cu thin films were deposited by the radio-frequency sputtering method at low substrate temperature using three kinds of targets; Zr₅₅Al₁₀Ni₅Cu₃₀ bulk metallic glass target (α-BMG target), crystallized bulk metallic glass target (c-BMG target), and an elemental composite target composed of each Zr, Al, Ni chips and Cu plate. XRD profiles of the films prepared when using these targets indicated that all of the films showed amorphous structures. While XRD profiles of the films using α and c-BMG targets revealed a broad peak of 2θ=38 degree in the same way as the α-BMG target indicating amorphous structures, that of the film using elemental composite targets showed a broad peak of 2θ=42 degree, which is higher compared to the latter material. As a result of annealing the films at various temperatures for 900 s, the film using the α-BMG target showed a crystallization temperature of 748 K, higher than that of BMG with723K, while the other films had lower crystallization temperatures below 723K. XRD profiles also indicated that the crystallized compounds of the films were different from those of BMG target.

10.18910/9505

9505

Structures of Metallic Glass Sputtered Films by Using Zr-Al-Ni-Cu Alloy Targets

大阪大学接合科学研究所

英語

2008-07

Transactions of JWRI

37

1

109

112

https://hdl.handle.net/11094/9505

10.18910/9505

https://doi.org/10.18910/9505