紀要論文

紀要論文

text

Transactions of JWRI. 2006, 35(2), p. 5-9

Fundamental Characteristics of a Microwave Discharge Type Plasma Source Working under Atmosphere Pressure

英語

text

2006-12

The microwave discharge plasma generated at low pressure has been used in many industrial productions as a manufacturing method for etching, or deposition, because it is clean and has high chemical reactivity. Recently, studies for microwave discharge plasma at atmospheric pressure also have begun. It has the advantage of low cost, because the costly vacuum chamber and pump for evacuation are not required for plasma generation. As the atmospheric microwave discharge plasma is also clean and has high chemical reactivity, it is expected to be used for the resolution and detoxification of environmental pollution gas and for surface treatment and electromagnetic coating at atmospheric pressure. In this work, the atmospheric microwave discharge plasma source has been developed and its fundamental characteristics investigated. Mixtures of argon and nitrogen gas were used for the working gases with a 2.45GHz microwave up to 600W. In the microwave power range, Ar was only discharged by adding N₂. This is similar to the Penning effect. Radiant intensity of the atmospheric microwave discharge plasma increased with an increase of N₂ in the working gas. By spectroscopic analysis, it was found that the emission was mainly produced by excitation of N₂ particles.

10.18910/9593

9593

Fundamental Characteristics of a Microwave Discharge Type Plasma Source Working under Atmosphere Pressure

大阪大学接合科学研究所

英語

2006-12

Transactions of JWRI

35

2

5

9

https://hdl.handle.net/11094/9593

10.18910/9593

https://doi.org/10.18910/9593