学術雑誌論文

学術雑誌論文

Applied Surface Science. 2024, 669, p. 160475

Dissociative adsorption of supersonic CH₃Cl on Cu oxide Surfaces: Cu₂O(111) and bulk Cu₂O precursor “29”-Structure on Cu(111)

Elsevier B.V.

英語

2024-10-01

https://doi.org/10.1016/j.apsusc.2024.160475

Hayashida K., Tsuda Y., Murase N., et al. Dissociative adsorption of supersonic CH₃Cl on Cu oxide Surfaces: Cu₂O(111) and bulk Cu₂O precursor “29”-Structure on Cu(111). Applied Surface Science 669, 160475 (2024); https://doi.org/10.1016/j.apsusc.2024.160475.

To examine the elementary steps of the Rochow-Müller process we placed copper oxides, viz., Cu₂O(111) and the bulk Cu₂O precursor “29”-structure on Cu(111), under supersonic molecular beams (SSMB) of CH₃Cl. The SSMB energies range from 0.5-1.9 eV. We employed X-ray photoemission spectroscopy (XPS) in conjunction with synchrotron radiation (SR) to determine the resulting adsorbed species present. We identified two reaction paths, viz., Reaction I and Reaction II. Reaction I involves dissociative adsorption of CH₃Cl. In Reaction II, CH₃Cl also dissociates, but with Cl as the dominant adsorbed species (higher than that of adsorbed carbonaceous species, as observed for Reaction I). For the incident energies and exposure conditions considered, we found Reaction II as the dominant reaction path for CH₃Cl reaction on both Cu₂O(111) and the “29”-structure on Cu(111).

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97654

Dissociative adsorption of supersonic CH₃Cl on Cu oxide Surfaces: Cu₂O(111) and bulk Cu₂O precursor “29”-Structure on Cu(111)

Elsevier B.V.

英語

2024-10-01

Applied Surface Science

669

160475

https://doi.org/10.1016/j.apsusc.2024.160475

https://hdl.handle.net/11094/97654