High Rate Zinc Oxide Film Deposition by Atmospheric TPCVD Using Ar/Air Plasma Jets

Ando, Yasutaka; Kobayashi, Akira; Tobe, Shogo; Tahara, Hiorokazu

doi:https://doi.org/10.18910/6123

このアイテムのアクセス数:128件（2023-12-11 15:41 集計）

このアイテムへのリンクには次のURLをご利用ください: https://doi.org/10.18910/6123

このアイテムへのリンクには次のURLをご利用ください: https://hdl.handle.net/11094/6123

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タイトル	High Rate Zinc Oxide Film Deposition by Atmospheric TPCVD Using Ar/Air Plasma Jets
著者	NRID 1000060306107 1000060306107 著者名 Ando, Yasutaka
	NRID 1000070110773 1000070110773 著者名 Kobayashi, Akira
	著者名 Tobe, Shogo
	著者名 Tahara, Hiorokazu
キーワード等	Thermal Spray
	Surface Modification
	CVD, Photo-catalyst
	Zinc Oxide
抄録	In order to develop a functional film deposition process with a high deposition rate, as a basic study, deposition of zinc oxide film by atmospheric thermal plasma CVD (TPCVD) was carried out. As feedstock, working gas and substrate, ethanol diluted zinc acetate solution, Ar and 430 stainless steel were used. As for the deposition conditions, Ar gas flow rate was fixed at 20SLM, deposition distance (distance between substrate surface and nozzle outlet of plasma torch) was fixed at 100 and 150 mm. Consequently, 100 μm thick photo-catalytic zinc oxide film could be obtained by only 5 min. deposition. Besides, by addition of air to Ar plasma jet, high enthalpy plasma jets could be obtained. From these results, this technique is found to have high potential for high rate and low cost zinc oxide film deposition.
出版者	大阪大学接合科学研究所
	オオサカダイガクセツゴウカガクケンキュウジョ
	Joining and Welding Research Institute, Osaka University
収録物名	Transactions of JWRI
巻(号)	37(1)
ページ	33-37
刊行年月	2008-07
言語	英語
ハンドルURL	https://hdl.handle.net/11094/6123
DOI	https://doi.org/10.18910/6123
PISSN	03874508
NCID	AA00867058
アクセス権	open access
出版タイプ	Version of Record
カテゴリ	紀要論文 Departmental Bulletin Paper
カテゴリ	Transactions of JWRI / Vol.37 No.1 (2008-07)

資源タイプ	紀要論文
ローカル資源タイプ	紀要論文
DCMI資源タイプ	text
DCTERMS.bibliographicCitation	Transactions of JWRI. 2008, 37(1), p. 33-37
DC.title	High Rate Zinc Oxide Film Deposition by Atmospheric TPCVD Using Ar/Air Plasma Jets
DC.creator	Ando, Yasutaka
	Kobayashi, Akira
	Tobe, Shogo
	Tahara, Hiorokazu
DC.publisher	大阪大学接合科学研究所
	オオサカダイガクセツゴウカガクケンキュウジョ
	Joining and Welding Research Institute, Osaka University
DC.language' scheme='DCTERMS.RFC1766	英語
DC.type' scheme='DCTERMS.DCMIType	text
DCTERMS.issued' scheme='DCTERMS.W3CDTF	2008-07
DC.subject	Thermal Spray
	Surface Modification
	CVD, Photo-catalyst
	Zinc Oxide
DCTERMS.abstract	In order to develop a functional film deposition process with a high deposition rate, as a basic study, deposition of zinc oxide film by atmospheric thermal plasma CVD (TPCVD) was carried out. As feedstock, working gas and substrate, ethanol diluted zinc acetate solution, Ar and 430 stainless steel were used. As for the deposition conditions, Ar gas flow rate was fixed at 20SLM, deposition distance (distance between substrate surface and nozzle outlet of plasma torch) was fixed at 100 and 150 mm. Consequently, 100 μm thick photo-catalytic zinc oxide film could be obtained by only 5 min. deposition. Besides, by addition of air to Ar plasma jet, high enthalpy plasma jets could be obtained. From these results, this technique is found to have high potential for high rate and low cost zinc oxide film deposition.
DC.identifier	10.18910/6123
DC.format	application/pdf
citation_doi	https://doi.org/10.18910/6123
citation_title	High Rate Zinc Oxide Film Deposition by Atmospheric TPCVD Using Ar/Air Plasma Jets
citation_author	Ando, Yasutaka
	Kobayashi, Akira
	Tobe, Shogo
	Tahara, Hiorokazu
citation_publisher	大阪大学接合科学研究所
	オオサカダイガクセツゴウカガクケンキュウジョ
	Joining and Welding Research Institute, Osaka University
citation_language	英語
citation_date	2008-07
citation_journal_title	Transactions of JWRI
citation_volume	37
citation_issue	1
citation_firstpage	33
citation_lastpage	37
citation_public_url	https://hdl.handle.net/11094/6123
citation_doi_detail	10.18910/6123

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