High Rate Zinc Oxide Film Deposition by Atmospheric TPCVD Using Ar/Air Plasma Jets

Ando, Yasutaka; Kobayashi, Akira; Tobe, Shogo et al.

Transactions of JWRI, 2008, 37(1), 33-37

アクセス数:329件（2025-07-11 21:11 集計）

固定URL: https://doi.org/10.18910/6123

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タイトル
High Rate Zinc Oxide Film Deposition by Atmospheric TPCVD Using Ar/Air Plasma Jets
著者
NRID
1000060306107 1000060306107
著者名
Ando, Yasutaka
NRID
1000070110773 1000070110773
著者名
Kobayashi, Akira
著者名
Tobe, Shogo
著者名
Tahara, Hiorokazu
キーワード等
Thermal Spray
Surface Modification
CVD, Photo-catalyst
Zinc Oxide
抄録
In order to develop a functional film deposition process with a high deposition rate, as a basic study, deposition of zinc oxide film by atmospheric thermal plasma CVD (TPCVD) was carried out. As feedstock, working gas and substrate, ethanol diluted zinc acetate solution, Ar and 430 stainless steel were used. As for the deposition conditions, Ar gas flow rate was fixed at 20SLM, deposition distance (distance between substrate surface and nozzle outlet of plasma torch) was fixed at 100 and 150 mm. Consequently, 100 μm thick photo-catalytic zinc oxide film could be obtained by only 5 min. deposition. Besides, by addition of air to Ar plasma jet, high enthalpy plasma jets could be obtained. From these results, this technique is found to have high potential for high rate and low cost zinc oxide film deposition.
出版者
大阪大学接合科学研究所
オオサカ ダイガク セツゴウ カガク ケンキュウジョ
Joining and Welding Research Institute, Osaka University
収録物名
Transactions of JWRI
巻(号)
37(1)
ページ
33-37
刊行年月
2008-07
言語
英語
ハンドルURL
https://hdl.handle.net/11094/6123
DOI
https://doi.org/10.18910/6123
PISSN
03874508
NCID
AA00867058
アクセス権
open access
出版タイプ
Version of Record
カテゴリ
紀要論文 Departmental Bulletin Paper
Transactions of JWRI / Vol.37 No.1 (2008-07)