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jwri37_01_033
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論文情報
タイトル
High Rate Zinc Oxide Film Deposition by Atmospheric TPCVD Using Ar/Air Plasma Jets
著者
Ando, Yasutaka
Ando, Yasutaka
Kobayashi, Akira
Kobayashi, Akira
Tobe, Shogo
Tobe, Shogo
Tahara, Hiorokazu
Tahara, Hiorokazu
キーワード等
Thermal Spray
Surface Modification
CVD, Photo-catalyst
Zinc Oxide
抄録
In order to develop a functional film deposition process with a high deposition rate, as a basic study, deposition of zinc oxide film by atmospheric thermal plasma CVD (TPCVD) was carried out. As feedstock, working gas and substrate, ethanol diluted zinc acetate solution, Ar and 430 stainless steel were used. As for the deposition conditions, Ar gas flow rate was fixed at 20SLM, deposition distance (distance between substrate surface and nozzle outlet of plasma torch) was fixed at 100 and 150 mm. Consequently, 100 μm thick photo-catalytic zinc oxide film could be obtained by only 5 min. deposition. Besides, by addition of air to Ar plasma jet, high enthalpy plasma jets could be obtained. From these results, this technique is found to have high potential for high rate and low cost zinc oxide film deposition.
公開者
大阪大学接合科学研究所
公開者の別表記
Joining and Welding Research Institute, Osaka University
公開者 (ヨミ)
オオサカ ダイガク セツゴウ カガク ケンキュウジョ
掲載誌名
Transactions of JWRI
巻
37
号
1
開始ページ
33
終了ページ
37
刊行年月
2008-07
ISSN
03874508
NCID
AA00867058
URL
http://hdl.handle.net/11094/6123
言語
英語
カテゴリ
紀要論文 Departmental Bulletin Paper
Transactions of JWRI / Vol.37 No.1 (2008-07)
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著者版フラグ
publisher
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text
DCTERMS.bibliographicCitation
Transactions of JWRI.37(1) P.33-P.37
DC.title
High Rate Zinc Oxide Film Deposition by Atmospheric TPCVD Using Ar/Air Plasma Jets
DC.creator
Ando, Yasutaka
Kobayashi, Akira
Tobe, Shogo
Tahara, Hiorokazu
DC.publisher
大阪大学接合科学研究所
DC.language" scheme="DCTERMS.RFC1766
英語
DCTERMS.issued" scheme="DCTERMS.W3CDTF
2008-07
DC.identifier" scheme="DCTERMS.URI
http://hdl.handle.net/11094/6123
DC.subject
Thermal Spray
Surface Modification
CVD, Photo-catalyst
Zinc Oxide
DCTERMS.abstract
In order to develop a functional film deposition process with a high deposition rate, as a basic study, deposition of zinc oxide film by atmospheric thermal plasma CVD (TPCVD) was carried out. As feedstock, working gas and substrate, ethanol diluted zinc acetate solution, Ar and 430 stainless steel were used. As for the deposition conditions, Ar gas flow rate was fixed at 20SLM, deposition distance (distance between substrate surface and nozzle outlet of plasma torch) was fixed at 100 and 150 mm. Consequently, 100 μm thick photo-catalytic zinc oxide film could be obtained by only 5 min. deposition. Besides, by addition of air to Ar plasma jet, high enthalpy plasma jets could be obtained. From these results, this technique is found to have high potential for high rate and low cost zinc oxide film deposition.
citation_title
High Rate Zinc Oxide Film Deposition by Atmospheric TPCVD Using Ar/Air Plasma Jets
citation_author
Ando, Yasutaka
Kobayashi, Akira
Tobe, Shogo
Tahara, Hiorokazu
citation_publisher
大阪大学接合科学研究所
citation_language
英語
citation_date
2008-07
citation_journal_title
Transactions of JWRI
citation_volume
37
citation_issue
1
citation_firstpage
33
citation_lastpage
37
citation_issn
03874508
citation_public_url
http://hdl.handle.net/11094/6123
citation_keywords
Thermal Spray
Surface Modification
CVD, Photo-catalyst
Zinc Oxide