High Rate Zinc Oxide Film Deposition by Atmospheric TPCVD Using Ar/Air Plasma Jets

Ando, Yasutaka; Kobayashi, Akira; Tobe, Shogo; Tahara, Hiorokazu

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タイトル	High Rate Zinc Oxide Film Deposition by Atmospheric TPCVD Using Ar/Air Plasma Jets
著者	Ando, Yasutaka Ando, Yasutaka
	Kobayashi, Akira Kobayashi, Akira
	Tobe, Shogo Tobe, Shogo
	Tahara, Hiorokazu Tahara, Hiorokazu
キーワード等	Thermal Spray
	Surface Modification
	CVD, Photo-catalyst
	Zinc Oxide
抄録	In order to develop a functional film deposition process with a high deposition rate, as a basic study, deposition of zinc oxide film by atmospheric thermal plasma CVD (TPCVD) was carried out. As feedstock, working gas and substrate, ethanol diluted zinc acetate solution, Ar and 430 stainless steel were used. As for the deposition conditions, Ar gas flow rate was fixed at 20SLM, deposition distance (distance between substrate surface and nozzle outlet of plasma torch) was fixed at 100 and 150 mm. Consequently, 100 μm thick photo-catalytic zinc oxide film could be obtained by only 5 min. deposition. Besides, by addition of air to Ar plasma jet, high enthalpy plasma jets could be obtained. From these results, this technique is found to have high potential for high rate and low cost zinc oxide film deposition.
公開者	大阪大学接合科学研究所
公開者の別表記	Joining and Welding Research Institute, Osaka University
公開者 (ヨミ)	オオサカダイガクセツゴウカガクケンキュウジョ
掲載誌名	Transactions of JWRI
巻	37
号	1
開始ページ	33
終了ページ	37
刊行年月	2008-07
ISSN	03874508
NCID	AA00867058
URL	http://hdl.handle.net/11094/6123
言語	英語
カテゴリ	紀要論文 Departmental Bulletin Paper
カテゴリ	Transactions of JWRI / Vol.37 No.1 (2008-07)

著者版フラグ	publisher
NII資源タイプ	紀要論文
ローカル資源タイプ	紀要論文
dcmi資源タイプ	text
DCTERMS.bibliographicCitation	Transactions of JWRI.37(1) P.33-P.37
DC.title	High Rate Zinc Oxide Film Deposition by Atmospheric TPCVD Using Ar/Air Plasma Jets
DC.creator	Ando, Yasutaka
	Kobayashi, Akira
	Tobe, Shogo
	Tahara, Hiorokazu
DC.publisher	大阪大学接合科学研究所
DC.language" scheme="DCTERMS.RFC1766	英語
DCTERMS.issued" scheme="DCTERMS.W3CDTF	2008-07
DC.identifier" scheme="DCTERMS.URI	http://hdl.handle.net/11094/6123
DC.subject	Thermal Spray
	Surface Modification
	CVD, Photo-catalyst
	Zinc Oxide
DCTERMS.abstract	In order to develop a functional film deposition process with a high deposition rate, as a basic study, deposition of zinc oxide film by atmospheric thermal plasma CVD (TPCVD) was carried out. As feedstock, working gas and substrate, ethanol diluted zinc acetate solution, Ar and 430 stainless steel were used. As for the deposition conditions, Ar gas flow rate was fixed at 20SLM, deposition distance (distance between substrate surface and nozzle outlet of plasma torch) was fixed at 100 and 150 mm. Consequently, 100 μm thick photo-catalytic zinc oxide film could be obtained by only 5 min. deposition. Besides, by addition of air to Ar plasma jet, high enthalpy plasma jets could be obtained. From these results, this technique is found to have high potential for high rate and low cost zinc oxide film deposition.
citation_title	High Rate Zinc Oxide Film Deposition by Atmospheric TPCVD Using Ar/Air Plasma Jets
citation_author	Ando, Yasutaka
	Kobayashi, Akira
	Tobe, Shogo
	Tahara, Hiorokazu
citation_publisher	大阪大学接合科学研究所
citation_language	英語
citation_date	2008-07
citation_journal_title	Transactions of JWRI
citation_volume	37
citation_issue	1
citation_firstpage	33
citation_lastpage	37
citation_issn	03874508
citation_public_url	http://hdl.handle.net/11094/6123
citation_keywords	Thermal Spray
	Surface Modification
	CVD, Photo-catalyst
	Zinc Oxide

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