Interference Exposure Fabrication of Blazed Grating by Phase-shifting Mask

Ura, Shogo; Kintaka, Kenji; Awazu, Hideyuki; Nishio, Kenzo; Awatsuji, Yasuhiro; Nishii, Junji

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タイトル	Interference Exposure Fabrication of Blazed Grating by Phase-shifting Mask
著者	Ura, Shogo Ura, Shogo
	Kintaka, Kenji Kintaka, Kenji
	Awazu, Hideyuki Awazu, Hideyuki
	Nishio, Kenzo Nishio, Kenzo
	Awatsuji, Yasuhiro Awatsuji, Yasuhiro
	Nishii, Junji Nishii, Junji
抄録	A simple interference exposure method using a phase-shifting mask was discussed on the basis of Fourier synthesis for fabricating blazed gratings. A phase-shifting mask was designed with 244 nm exposure-light wavelength to launch multiple diffraction beams so that resultant interference pattern fit to required optical intensity profile. Fine surface-relief pattern on Si02 mask for 3μm-period sawtooth optical-intensity profile was fabricated by electron-beam direct-writing lithography with 30 nm scanning step and relief height of 65 nm. Sawtooth-like intensity profile was demonstrated with theoretically predicted interference visibility. A UV photoresist was exposed through the fabricated phase-shifting mask and developed to form a blazed grating.
公開者	電気材料技術懇談会
公開者 (ヨミ)	デンキ　ザイリョウ　ギジュツ　コンダンカイ
掲載誌名	電気材料技術雑誌
巻	20
号	2
開始ページ	79
終了ページ	82
刊行年月	2011-12-25
URL	http://hdl.handle.net/11094/76882
言語	英語
カテゴリ	本学関連学会 Related Societies
カテゴリ	電気材料技術雑誌 / 第20巻 / 第2号

著者版フラグ	publisher
NII資源タイプ	学術雑誌論文
ローカル資源タイプ	本学関連学会
dcmi資源タイプ	text
DCTERMS.bibliographicCitation	電気材料技術雑誌.20(2) P.79-P.82
DC.title	Interference Exposure Fabrication of Blazed Grating by Phase-shifting Mask
DC.creator	Ura, Shogo
	Kintaka, Kenji
	Awazu, Hideyuki
	Nishio, Kenzo
	Awatsuji, Yasuhiro
	Nishii, Junji
DC.publisher	電気材料技術懇談会
DC.language" scheme="DCTERMS.RFC1766	英語
DCTERMS.issued" scheme="DCTERMS.W3CDTF	2011-12-25
DC.identifier" scheme="DCTERMS.URI	http://hdl.handle.net/11094/76882
DCTERMS.abstract	A simple interference exposure method using a phase-shifting mask was discussed on the basis of Fourier synthesis for fabricating blazed gratings. A phase-shifting mask was designed with 244 nm exposure-light wavelength to launch multiple diffraction beams so that resultant interference pattern fit to required optical intensity profile. Fine surface-relief pattern on Si02 mask for 3μm-period sawtooth optical-intensity profile was fabricated by electron-beam direct-writing lithography with 30 nm scanning step and relief height of 65 nm. Sawtooth-like intensity profile was demonstrated with theoretically predicted interference visibility. A UV photoresist was exposed through the fabricated phase-shifting mask and developed to form a blazed grating.
citation_title	Interference Exposure Fabrication of Blazed Grating by Phase-shifting Mask
citation_author	Ura, Shogo
	Kintaka, Kenji
	Awazu, Hideyuki
	Nishio, Kenzo
	Awatsuji, Yasuhiro
	Nishii, Junji
citation_publisher	電気材料技術懇談会
citation_language	英語
citation_date	2011-12-25
citation_journal_title	電気材料技術雑誌
citation_volume	20
citation_issue	2
citation_firstpage	79
citation_lastpage	82
citation_public_url	http://hdl.handle.net/11094/76882

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