学術雑誌論文

本学関連学会

text

電気材料技術雑誌. 2011, 20(2), p. 79-82

Interference Exposure Fabrication of Blazed Grating by Phase-shifting Mask

英語

text

2011-12-25

A simple interference exposure method using a phase-shifting mask was discussed on the basis of Fourier synthesis for fabricating blazed gratings. A phase-shifting mask was designed with 244 nm exposure-light wavelength to launch multiple diffraction beams so that resultant interference pattern fit to required optical intensity profile. Fine surface-relief pattern on Si02 mask for 3μm-period sawtooth optical-intensity profile was fabricated by electron-beam direct-writing lithography with 30 nm scanning step and relief height of 65 nm. Sawtooth-like intensity profile was demonstrated with theoretically predicted interference visibility. A UV photoresist was exposed through the fabricated phase-shifting mask and developed to form a blazed grating.

76882

Interference Exposure Fabrication of Blazed Grating by Phase-shifting Mask

電気材料技術懇談会

英語

2011-12-25

電気材料技術雑誌

20

2

79

82

https://hdl.handle.net/11094/76882