Effects of photon irradiation in UV and VUV regions during plasma processing of organic materials

Cho, Ken; Takenaka, Kosuke; Setsuhara, Yuichi et al.

Transactions of JWRI, 2010, 39(2), 298-300

Number of Access:8062025-08-14 01:38 Counts

Identifier to cite or link to this item: https://doi.org/10.18910/24830

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