Fabrication of nanoscale gaps using a combination of self-assembled molecular and electron beam lithographic techniques

Negishi, R; Hasegawa, T; Terabe, K et al.

APPLIED PHYSICS LETTERS, 2006, 88(22), 223111-1-223111-3

Number of Access:527（2025-06-25 14:16 Counts）

Identifier to cite or link to this item: https://hdl.handle.net/11094/3175

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Title	Fabrication of nanoscale gaps using a combination of self-assembled molecular and electron beam lithographic techniques
Creator	CreatorName Negishi, R
	CreatorName Hasegawa, T
	CreatorName Terabe, K
	CreatorName Aono, M
	NRID 1000010813975 1000010813975 ORCID 0000-0003-4101-0419 0000-0003-4101-0419 researchmap permalink ebihara830 ebihara830 CreatorName Ebihara, T
	CreatorName Tanaka, H
	NRID 1000080169185 1000080169185 CreatorName Ogawa, T
Description	Copyright 2006 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in Applied Physics Letters, 88(22), 223111, 2006 and may be found at http://dx.doi.org/10.1063/1.2209208
Publisher	American Institute of Physics
Source Title	APPLIED PHYSICS LETTERS
Volume (Issue)	88(22)
Page	223111-1-223111-3
Date of Issued	2006-05-29
Language	English
Handle URL	https://hdl.handle.net/11094/3175
PISSN	00036951
NCID	AA00543431
Relation.isIdenticalTo	DOI (Publisher Version) https://doi.org/10.1063/1.2209208
Access Rights	open access
oaire:version	Version of Record
Category	学術雑誌論文 Journal Article

Resource Type	journal article
Local Type	Journal Article
DCMI Type	Text
DCTERMS.bibliographicCitation	APPLIED PHYSICS LETTERS. 2006, 88(22), p. 223111-1-223111-3
DC.title	Fabrication of nanoscale gaps using a combination of self-assembled molecular and electron beam lithographic techniques
DC.creator	Negishi, R
	Hasegawa, T
	Terabe, K
	Aono, M
	Ebihara, T
	Tanaka, H
	Ogawa, T
DC.publisher	American Institute of Physics
DC.language' scheme='DCTERMS.RFC1766	English
DC.type' scheme='DCTERMS.DCMIType	Text
DCTERMS.issued' scheme='DCTERMS.W3CDTF	2006-05-29
DC.identifier	https://doi.org/10.1063/1.2209208
DC.description	Copyright 2006 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in Applied Physics Letters, 88(22), 223111, 2006 and may be found at http://dx.doi.org/10.1063/1.2209208
DC.format	3175
citation_title	Fabrication of nanoscale gaps using a combination of self-assembled molecular and electron beam lithographic techniques
citation_author	Negishi, R
	Hasegawa, T
	Terabe, K
	Aono, M
	Ebihara, T
	Tanaka, H
	Ogawa, T
citation_publisher	American Institute of Physics
citation_language	English
citation_date	2006-05-29
citation_journal_title	APPLIED PHYSICS LETTERS
citation_volume	88
citation_issue	22
citation_firstpage	223111-1
citation_lastpage	223111-3
citation_doi	https://doi.org/10.1063/1.2209208
citation_public_url	https://hdl.handle.net/11094/3175