Comparative Study of Mg-Si Films Deposited by DC- and RF- Glow Discharge Sputtering

Serikawa, Tadashi; Kawabata, Kenshi; Kondoh, Katsuyoshi

Transactions of JWRI, 2007, 36(2), 39-43

Number of Access:285（2025-06-07 18:38 Counts）

Identifier to cite or link to this item: https://doi.org/10.18910/5801

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Title
Comparative Study of Mg-Si Films Deposited by DC- and RF- Glow Discharge Sputtering
Creator
NRID
1000010345168 1000010345168
CreatorName
Serikawa, Tadashi
NRID
1000050432422 1000050432422
CreatorName
Kawabata, Kenshi
NRID
1000050345138 1000050345138
researchmap permalink
kondoh kondoh
Scopus Author ID
9942942300 9942942300
CreatorName
Kondoh, Katsuyoshi
Subject
Glow Discharge
Direct Current (DC-) Sputtering
Radio Frequency (RF-) Sputtering
Intermetallic Compound
Magnesium Silicide (Mg2Si)
Mg-Si Thin Films
Abstract
Mg-Si thin films were deposited at low substrate temperature by direct current (DC)- and radio frequency (RF)- glow discharge sputtering from targets composed of Mg and Si plates with area ratios of 25%:75% and 50%:50%. X-ray diffraction measurements clarified that films deposited by both DC- and RF- glow discharge sputtering from the target of Mg:Si =25%:75% showed the intermetallic compound magnesium silicide (Mg₂Si). Structural, mechanical, and corrosion-resistance properties of Mg-Si films deposited from the target of Mg:Si =25%:75% were examined. The films for both DC- and RF- sputtering showed stack structures consisting of crystalline Mg₂Si layers with columnar and amorphous phase layers. However, the amorphous phase layer for an RF-sputtered film was shown to be much thicker than that for the DC-sputtered film. Mechanical properties of elastic modulus and hardness measured by the nano-indentor method for RF-sputtered films were higher than those for DC-sputtered films. Corrosion-resistance tests in a 5% sodium spray test showed that RF-sputtered films also had superior corrosion-resistance properties to DC-sputtered films. These mechanical and corrosion-resistance properties are strictly caused by the crystalline property and film structure of sputtered Mg-Si films. In this paper, the properties of DC- and RF- sputtered films are also discussed together with film deposition.
Publisher
大阪大学接合科学研究所
オオサカ ダイガク セツゴウ カガク ケンキュウジョ
Joining and Welding Research Institute, Osaka University
Source Title
Transactions of JWRI
Volume (Issue)
36(2)
Page
39-43
Date of Issued
2007-12
Language
English
Handle URL
https://hdl.handle.net/11094/5801
DOI
https://doi.org/10.18910/5801
PISSN
03874508
NCID
AA00867058
Access Rights
open access
oaire:version
Version of Record
Category
紀要論文 Departmental Bulletin Paper
Transactions of JWRI / Vol.36 No.2 (2007-12)