Preparation of Si-microspikes by Electrochemical Etching and Field Emission Characteristics from Diamond particles on the Si-microspikes prepared by Plasma CVD
Ohtsuka, Keisuke; Moritani, Akihiro; Ojima, Masayoshi et al.
電気材料技術雑誌, 2008, 17, 44-51
Number of Access:535(2025-11-01 13:10 Counts)
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Identifier to cite or link to this item: https://hdl.handle.net/11094/76850
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2020.09.04
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