Preparation of Si-microspikes by Electrochemical Etching and Field Emission Characteristics from Diamond particles on the Si-microspikes prepared by Plasma CVD

Ohtsuka, Keisuke; Moritani, Akihiro; Ojima, Masayoshi et al.

電気材料技術雑誌, 2008, 17, 44-51

Number of Access:5152025-09-02 13:02 Counts

Identifier to cite or link to this item: https://hdl.handle.net/11094/76850

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