Effects of hydrogen ion irradiation on zinc oxide etching

Li, Hu; Karahashi, Kazuhiro; Friederich, Pascal; Fink, Karin; Fukasawa, Masanaga; Hirata, Akiko; Nagahata, Kazunori; Tatsumi, Tetsuya; Wenzel, Wolfgang; Hamaguchi, Satoshi

doi:https://doi.org/10.1116/1.4982715

Effects of hydrogen ion irradiation on zinc oxide etching

Li, Hu; Karahashi, Kazuhiro; Friederich, Pascal et al.

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 2017, 35(5), 05C303

Number of Access:618（2025-10-05 09:51 Counts）

Identifier to cite or link to this item: https://hdl.handle.net/11094/78460

Link to primary information

File	Format	Terms of use	Size	Views	Date.Available	Description	information
JVacSciTechnolA_35_05_05C303	pdf	None	1.84 MB	312	2021.02.05

Item Information

Output File Export EndNote Basic Export Mendeley

Title	Effects of hydrogen ion irradiation on zinc oxide etching
Creator	CreatorName Li, Hu
	NRID 1000060451118 1000060451118 ORCID 0000-0001-9951-6573 0000-0001-9951-6573 researchmap permalink karahashi karahashi Scopus Author ID 6602275601 6602275601 CreatorName Karahashi, Kazuhiro
	CreatorName Friederich, Pascal
	CreatorName Fink, Karin
	CreatorName Fukasawa, Masanaga
	CreatorName Hirata, Akiko
	CreatorName Nagahata, Kazunori
	CreatorName Tatsumi, Tetsuya
	CreatorName Wenzel, Wolfgang
	NRID 1000060301826 1000060301826 ORCID 0000-0001-6580-8797 0000-0001-6580-8797 researchmap permalink satoshi_hamaguchi satoshi_hamaguchi Scopus Author ID 55220082400 55220082400 CreatorName Hamaguchi, Satoshi
Description	H. Li et al., Journal of Vacuum Science & Technology A 35, 05C303 (2017) https://doi.org/10.1116/1.4982715
Abstract	Mechanisms of zinc oxide (ZnO) etching by hydrocarbon plasmas were investigated both experimentally and theoretically with the use of a mass-selected ion beam system and first-principle quantum mechanical (QM) simulation based on the density functional theory. The mass-selected ion beam experiments have shown that the sputtering yield of ZnO increases by a pretreatment of the ZnO film by energetic hydrogen (H) ion injections prior to heavy ion bombardment, suggesting that chemically enhanced etching of ZnO by hydrocarbon plasmas is closely related to hydrogen storage and/or formation of damage in the ZnO layer by energetic hydrogen injections. In this study, the effects of hydrogen storage in ZnO are examined. First-principle QM simulation of ZnO interacting with H atoms has shown that H atoms in ZnO form hydroxyl (OH) groups (or partially convert ZnO to ZnOH), which results in the weakening or breaking of the Zn-O bonds around H atoms and thus makes the ZnO film more prone to physical sputtering. The formation of hydroxyl groups in ZnO is also expected to occur in ZnO etching by hydrocarbon plasmas and increase its sputtering yields over those by inert-gas plasmas generated under similar conditions.
Publisher	American Institute of Physics
Source Title	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume (Issue)	35(5)
Page	05C303
Date of Issued	2017-09
Language	English
Handle URL	https://hdl.handle.net/11094/78460
PISSN	07342101
eISSN	15208559
NCID	AA10635514
Relation.isIdenticalTo	DOI (Publisher Version) https://doi.org/10.1116/1.4982715
Access Rights	open access
CopyRight	This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. This article appeared in Journal of Vacuum Science & Technology A 35, 05C303 (2017) and may be found at https://doi.org/10.1116/1.4982715.
oaire:version	Version of Record
Category	学術雑誌論文 Journal Article

Resource Type	journal article
Local Type	Journal Article
DCTERMS.bibliographicCitation	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 2017, 35(5), p. 05C303
DC.title	Effects of hydrogen ion irradiation on zinc oxide etching
DC.creator	Li, Hu
	Karahashi, Kazuhiro
	Friederich, Pascal
	Fink, Karin
	Fukasawa, Masanaga
	Hirata, Akiko
	Nagahata, Kazunori
	Tatsumi, Tetsuya
	Wenzel, Wolfgang
	Hamaguchi, Satoshi
DC.publisher	American Institute of Physics
DC.language' scheme='DCTERMS.RFC1766	English
DCTERMS.issued' scheme='DCTERMS.W3CDTF	2017-09
DC.identifier	https://doi.org/10.1116/1.4982715
DC.description	H. Li et al., Journal of Vacuum Science & Technology A 35, 05C303 (2017) https://doi.org/10.1116/1.4982715
DCTERMS.abstract	Mechanisms of zinc oxide (ZnO) etching by hydrocarbon plasmas were investigated both experimentally and theoretically with the use of a mass-selected ion beam system and first-principle quantum mechanical (QM) simulation based on the density functional theory. The mass-selected ion beam experiments have shown that the sputtering yield of ZnO increases by a pretreatment of the ZnO film by energetic hydrogen (H) ion injections prior to heavy ion bombardment, suggesting that chemically enhanced etching of ZnO by hydrocarbon plasmas is closely related to hydrogen storage and/or formation of damage in the ZnO layer by energetic hydrogen injections. In this study, the effects of hydrogen storage in ZnO are examined. First-principle QM simulation of ZnO interacting with H atoms has shown that H atoms in ZnO form hydroxyl (OH) groups (or partially convert ZnO to ZnOH), which results in the weakening or breaking of the Zn-O bonds around H atoms and thus makes the ZnO film more prone to physical sputtering. The formation of hydroxyl groups in ZnO is also expected to occur in ZnO etching by hydrocarbon plasmas and increase its sputtering yields over those by inert-gas plasmas generated under similar conditions.
DC.rights	This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. This article appeared in Journal of Vacuum Science & Technology A 35, 05C303 (2017) and may be found at https://doi.org/10.1116/1.4982715.
DC.format	78460
citation_title	Effects of hydrogen ion irradiation on zinc oxide etching
citation_author	Li, Hu
	Karahashi, Kazuhiro
	Friederich, Pascal
	Fink, Karin
	Fukasawa, Masanaga
	Hirata, Akiko
	Nagahata, Kazunori
	Tatsumi, Tetsuya
	Wenzel, Wolfgang
	Hamaguchi, Satoshi
citation_publisher	American Institute of Physics
citation_language	English
citation_date	2017-09
citation_journal_title	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
citation_volume	35
citation_issue	5
citation_firstpage	05C303
citation_doi	https://doi.org/10.1116/1.4982715
citation_public_url	https://hdl.handle.net/11094/78460

Effects of hydrogen ion irradiation on zinc oxide etching

Link to primary information

Item Information

Show details