journal article

Journal Article

Journal of Applied Physics. 2007, 101(4), p. 046108

Molecular dynamics simulation study on substrate temperature dependence of sputtering yields for an organic polymer under ion bombardment

American Institute of Physics

English

2007-02-15

https://doi.org/10.1063/1.2433132

M. Yamashiro et al., Journal of Applied Physics 101, 046108 (2007) https://doi.org/10.1063/1.2433132

Substrate temperature dependence of sputtering yields in organic polymer etching processes has been examined with the use of molecular dynamics (MD) simulations. The simulation results indicate that structural weakness arising from high substrate temperatures alone is not sufficient to account for the experimentally observed strong dependence of sputtering yields on substrate temperatures. In other words, thermal desorption is likely to increase significantly at high substrate temperatures in reactive ion etching processes of organic polymers. © 2007 American Institute of Physics.

This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. This article appeared in Journal of Applied Physics 101, 046108 (2007) and may be found at https://doi.org/10.1063/1.2433132.

78479

Molecular dynamics simulation study on substrate temperature dependence of sputtering yields for an organic polymer under ion bombardment

American Institute of Physics

English

2007-02-15

Journal of Applied Physics

101

4

046108

https://doi.org/10.1063/1.2433132

https://hdl.handle.net/11094/78479