Liner conformality in ionized magnetron sputter metal deposition processes

Hamaguchi, S.; Rossnagel, S. M.

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 1996, 14(4), 2603-2608

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Identifier to cite or link to this item: https://hdl.handle.net/11094/78499

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Title
Liner conformality in ionized magnetron sputter metal deposition processes
Creator
NRID
1000060301826 1000060301826
ORCID
0000-0001-6580-8797 0000-0001-6580-8797
researchmap permalink
satoshi_hamaguchi satoshi_hamaguchi
Scopus Author ID
55220082400 55220082400
CreatorName
Hamaguchi, S.
CreatorName
Rossnagel, S. M.
Description
S. Hamaguchi and S. M. Rossnagel, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena 14, 2603 (1996) https://doi.org/10.1116/1.588993
Abstract
The conformality of thin metal films (liners) formed on high-aspect-ratio trench structures in ionized magnetron sputter deposition processes is studied numerically and experimentally. The numerical simulator (SHADE) used to predict the surface topography is based on the shock-tracking method for surface evolution. The simulation results are in good agreement with experimentally observed thin-film topography. It is shown that combination of direct deposition and trench-bottom resputtering results in good conformality of step coverages and the amount of the resputtering needed for the good conformality is almost independent of trench aspect ratios. © 1996 American Vacuum Society.
Publisher
American Institute of Physics Inc.
Source Title
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume (Issue)
14(4)
Page
2603-2608
Date of Issued
1996-07
Language
English
Handle URL
https://hdl.handle.net/11094/78499
PISSN
10711023
NCID
AA10804928
Relation.isIdenticalTo
DOI (Publisher Version)
https://doi.org/10.1116/1.588993
Access Rights
open access
CopyRight
This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. This article appeared in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena 14, 2603 (1996) and may be found at https://doi.org/10.1116/1.588993.
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Version of Record
Category
学術雑誌論文 Journal Article