Temperature behavior of sound velocity of fluorine-doped vitreous silica thin films studied by picosecond ultrasonics

Nagakubo, A.; Ogi, H.; Ishida, H.; Hirao, M.; Yokoyama, T.; Nishihara, T.

doi:https://doi.org/10.1063/1.4923353

Temperature behavior of sound velocity of fluorine-doped vitreous silica thin films studied by picosecond ultrasonics

Nagakubo, A.; Ogi, H.; Ishida, H. et al.

Journal of Applied Physics, 2015, 118(1), 014307-1-014307-8

Number of Access:521（2025-10-09 11:46 Counts）

Identifier to cite or link to this item: https://hdl.handle.net/11094/83928

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Title	Temperature behavior of sound velocity of fluorine-doped vitreous silica thin films studied by picosecond ultrasonics
Creator	NRID 1000070751113 1000070751113 ORCID 0000-0001-7494-5099 0000-0001-7494-5099 researchmap permalink nagakubo nagakubo Scopus Author ID 55329400300 55329400300 CreatorName Nagakubo, A.
	NRID 1000090252626 1000090252626 researchmap permalink read0042771 read0042771 Scopus Author ID 35563683500 35563683500 CreatorName Ogi, H.
	NRID 1000080283737 1000080283737 CreatorName Ishida, H.
	NRID 1000080112027 1000080112027 CreatorName Hirao, M.
	CreatorName Yokoyama, T.
	CreatorName Nishihara, T.
Description	Nagakubo A., Ogi H., Ishida H., et al. Temperature behavior of sound velocity of fluorine-doped vitreous silica thin films studied by picosecond ultrasonics. Journal of Applied Physics, 118(1), 014307 (2015) https://doi.org/10.1063/1.4923353.
Abstract	Vitreous silica (v-SiO2) shows anomalous temperature dependence of velocity, including positive temperature coefficient of velocity (TCV) and velocity minimum around 70 K. The former characteristic allows its application in acoustic-resonator devices as a temperature compensating material. In this paper, we study the temperature dependence of velocity of fluorine-doped v-SiO2 (v-SiO2-xFx) thin films using picosecond ultrasonic spectroscopy. To correct the temperature increase caused by irradiation with light pulses, we calculated the steady temperature increase in the measuring volume with a finite volume method, considering the temperature dependence of thermal conductivity, and find that temperature in the measurement region remains high even when the back surface is cryogenically cooled. Using the corrected temperature, we determine TCV of v-SiO2-xFx thin films for 0 < x < 0.264, which increases as x increases and is smaller than reported bulk values by a factor of 0.5 - 0.7. The velocity minimum is absent for the film with x = 0, but it is clearly observed at 70 K for the film with the highest fluorine concentration of x = 0.264. These temperature behaviors are attributed to the change in the Si-O-Si bond angle caused by the fluorine doping.
Publisher	American Institute of Physics
Source Title	Journal of Applied Physics
Volume (Issue)	118(1)
Page	014307-1-014307-8
Date of Issued	2015-07-02
Language	English
Handle URL	https://hdl.handle.net/11094/83928
PISSN	00218979
eISSN	10897550
NCID	AA11868165
Relation.isIdenticalTo	DOI (Publisher Version) https://doi.org/10.1063/1.4923353
Access Rights	open access
CopyRight	Copyright 2015 AIP Publishing LLC. This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. This article appeared in Journal of Applied Physics, 118(1), 014307, 2015 and may be found at https://doi.org/10.1063/1.4923353.
oaire:version	Version of Record
Category	学術雑誌論文 Journal Article

Resource Type	journal article
Local Type	Journal Article
DCMI Type	Text
DCTERMS.bibliographicCitation	Journal of Applied Physics. 2015, 118(1), p. 014307-1-014307-8
DC.title	Temperature behavior of sound velocity of fluorine-doped vitreous silica thin films studied by picosecond ultrasonics
DC.creator	Nagakubo, A.
	Ogi, H.
	Ishida, H.
	Hirao, M.
	Yokoyama, T.
	Nishihara, T.
DC.publisher	American Institute of Physics
DC.language' scheme='DCTERMS.RFC1766	English
DC.type' scheme='DCTERMS.DCMIType	Text
DCTERMS.issued' scheme='DCTERMS.W3CDTF	2015-07-02
DC.identifier	https://doi.org/10.1063/1.4923353
DC.description	Nagakubo A., Ogi H., Ishida H., et al. Temperature behavior of sound velocity of fluorine-doped vitreous silica thin films studied by picosecond ultrasonics. Journal of Applied Physics, 118(1), 014307 (2015) https://doi.org/10.1063/1.4923353.
DCTERMS.abstract	Vitreous silica (v-SiO2) shows anomalous temperature dependence of velocity, including positive temperature coefficient of velocity (TCV) and velocity minimum around 70 K. The former characteristic allows its application in acoustic-resonator devices as a temperature compensating material. In this paper, we study the temperature dependence of velocity of fluorine-doped v-SiO2 (v-SiO2-xFx) thin films using picosecond ultrasonic spectroscopy. To correct the temperature increase caused by irradiation with light pulses, we calculated the steady temperature increase in the measuring volume with a finite volume method, considering the temperature dependence of thermal conductivity, and find that temperature in the measurement region remains high even when the back surface is cryogenically cooled. Using the corrected temperature, we determine TCV of v-SiO2-xFx thin films for 0 < x < 0.264, which increases as x increases and is smaller than reported bulk values by a factor of 0.5 - 0.7. The velocity minimum is absent for the film with x = 0, but it is clearly observed at 70 K for the film with the highest fluorine concentration of x = 0.264. These temperature behaviors are attributed to the change in the Si-O-Si bond angle caused by the fluorine doping.
DC.rights	Copyright 2015 AIP Publishing LLC. This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. This article appeared in Journal of Applied Physics, 118(1), 014307, 2015 and may be found at https://doi.org/10.1063/1.4923353.
DC.format	83928
citation_title	Temperature behavior of sound velocity of fluorine-doped vitreous silica thin films studied by picosecond ultrasonics
citation_author	Nagakubo, A.
	Ogi, H.
	Ishida, H.
	Hirao, M.
	Yokoyama, T.
	Nishihara, T.
citation_publisher	American Institute of Physics
citation_language	English
citation_date	2015-07-02
citation_journal_title	Journal of Applied Physics
citation_volume	118
citation_issue	1
citation_firstpage	014307-1
citation_lastpage	014307-8
citation_doi	https://doi.org/10.1063/1.4923353
citation_public_url	https://hdl.handle.net/11094/83928

Temperature behavior of sound velocity of fluorine-doped vitreous silica thin films studied by picosecond ultrasonics

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