Recovery of elastic constant of ultrathin Cu films by low temperature annealing

Nakamura, N.; Ogi, H.; Shagawa, T.; Hirao, M.

doi:https://doi.org/10.1063/1.2908039

Recovery of elastic constant of ultrathin Cu films by low temperature annealing

Nakamura, N.; Ogi, H.; Shagawa, T. et al.

Applied Physics Letters, 2008, 92(14), 141901-1-141901-3

Number of Access:616（2025-11-25 02:18 Counts）

Identifier to cite or link to this item: https://hdl.handle.net/11094/84209

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Title	Recovery of elastic constant of ultrathin Cu films by low temperature annealing
Creator	NRID 1000050452404 1000050452404 researchmap permalink nnakamura nnakamura Scopus Author ID 7403356186 7403356186 ORCID 0000-0002-5338-842X 0000-0002-5338-842X CreatorName Nakamura, N.
	NRID 1000090252626 1000090252626 researchmap permalink read0042771 read0042771 Scopus Author ID 35563683500 35563683500 ORCID 0000-0002-9602-5194 0000-0002-9602-5194 CreatorName Ogi, H.
	CreatorName Shagawa, T.
	NRID 1000080112027 1000080112027 CreatorName Hirao, M.
Description	Nakamura N., Ogi H., Shagawa T., et al. "Recovery of elastic constant of ultrathin Cu films by low temperature annealing", Applied Physics Letters, 92(14), 141901 (2008) https://doi.org/10.1063/1.2908039.
Abstract	Annealing effect on the elastic constant of Cu thin films was investigated by acoustic-phonon resonance spectroscopy. Annealing treatment was performed after the deposition in vacuum condition for 30 min at various temperatures up to 200 °C. It did not cause obvious changes in the x-ray diffraction spectra, but it significantly increased the elastic constant. The elastic constant of the as-deposited Cu film was smaller than that of bulk Cu by 20%, and it recovered to the bulk value by the postannealing at 200 °C. © 2008 American Institute of Physics.
Publisher	American Institute of Physics
Source Title	Applied Physics Letters
Volume (Issue)	92(14)
Page	141901-1-141901-3
Date of Issued	2008-04-07
Language	English
Handle URL	https://hdl.handle.net/11094/84209
PISSN	00036951
eISSN	10773118
NCID	AA00543431
NCID	AA11868096
Relation.isIdenticalTo	DOI (Publisher Version) https://doi.org/10.1063/1.2908039
Access Rights	open access
CopyRight	This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. This article appeared in Applied Physics Letters, 92(14), 141901 (2008) and may be found at https://doi.org/10.1063/1.2908039.
oaire:version	Version of Record
Category	学術雑誌論文 Journal Article

Resource Type	journal article
Local Type	Journal Article
DCMI Type	Text
DCTERMS.bibliographicCitation	Applied Physics Letters. 2008, 92(14), p. 141901-1-141901-3
DC.title	Recovery of elastic constant of ultrathin Cu films by low temperature annealing
DC.creator	Nakamura, N.
	Ogi, H.
	Shagawa, T.
	Hirao, M.
DC.publisher	American Institute of Physics
DC.language' scheme='DCTERMS.RFC1766	English
DC.type' scheme='DCTERMS.DCMIType	Text
DCTERMS.issued' scheme='DCTERMS.W3CDTF	2008-04-07
DC.identifier	https://doi.org/10.1063/1.2908039
DC.description	Nakamura N., Ogi H., Shagawa T., et al. "Recovery of elastic constant of ultrathin Cu films by low temperature annealing", Applied Physics Letters, 92(14), 141901 (2008) https://doi.org/10.1063/1.2908039.
DCTERMS.abstract	Annealing effect on the elastic constant of Cu thin films was investigated by acoustic-phonon resonance spectroscopy. Annealing treatment was performed after the deposition in vacuum condition for 30 min at various temperatures up to 200 °C. It did not cause obvious changes in the x-ray diffraction spectra, but it significantly increased the elastic constant. The elastic constant of the as-deposited Cu film was smaller than that of bulk Cu by 20%, and it recovered to the bulk value by the postannealing at 200 °C. © 2008 American Institute of Physics.
DC.rights	This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. This article appeared in Applied Physics Letters, 92(14), 141901 (2008) and may be found at https://doi.org/10.1063/1.2908039.
DC.format	84209
citation_title	Recovery of elastic constant of ultrathin Cu films by low temperature annealing
citation_author	Nakamura, N.
	Ogi, H.
	Shagawa, T.
	Hirao, M.
citation_publisher	American Institute of Physics
citation_language	English
citation_date	2008-04-07
citation_journal_title	Applied Physics Letters
citation_volume	92
citation_issue	14
citation_firstpage	141901-1
citation_lastpage	141901-3
citation_doi	https://doi.org/10.1063/1.2908039
citation_public_url	https://hdl.handle.net/11094/84209

Recovery of elastic constant of ultrathin Cu films by low temperature annealing

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