Fast recovery of elastic stiffness in Ag thin film studied by resonant-ultrasound spectroscopy

Nakamura, Nobutomo; Nakashima, Takeo; Ogi, Hirotsugu; Hirao, Masahiko; Nishiyama, Masayoshi

doi:https://doi.org/10.1143/JJAP.48.07GA02

Fast recovery of elastic stiffness in Ag thin film studied by resonant-ultrasound spectroscopy

Nakamura, Nobutomo; Nakashima, Takeo; Ogi, Hirotsugu et al.

Japanese Journal of Applied Physics, 2009, 48, 07GA02

Number of Access:403（2025-11-25 02:18 Counts）

Identifier to cite or link to this item: https://hdl.handle.net/11094/84480

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Title	Fast recovery of elastic stiffness in Ag thin film studied by resonant-ultrasound spectroscopy
Creator	NRID 1000050452404 1000050452404 researchmap permalink nnakamura nnakamura Scopus Author ID 7403356186 7403356186 ORCID 0000-0002-5338-842X 0000-0002-5338-842X CreatorName Nakamura, Nobutomo
	CreatorName Nakashima, Takeo
	NRID 1000090252626 1000090252626 researchmap permalink read0042771 read0042771 Scopus Author ID 35563683500 35563683500 ORCID 0000-0002-9602-5194 0000-0002-9602-5194 CreatorName Ogi, Hirotsugu
	NRID 1000080112027 1000080112027 CreatorName Hirao, Masahiko
	CreatorName Nishiyama, Masayoshi
Description	Nobutomo Nakamura, Takeo Nakashima, Hirotsugu Ogi, Masahiko Hirao and Masayoshi Nishiyama. Fast recovery of elastic stiffness in Ag thin film studied by resonant-ultrasound spectroscopy. Japanese Journal of Applied Physics, 2009, 48(7S), 07GA02. https://doi.org/10.1143/JJAP.48.07GA02.
Abstract	We studied the recovery of the elastic constant of sputtered Ag films on monocrystal Si substrates by monitoring the resonance frequency of film/substrate specimens throughout the deposition process using resonant-ultrasound spectroscopy. An Ag film is deposited on a (001) Si substrate, which is located on the tripod transducer set in the sputtering chamber. The free-vibration resonance frequency of the Ag/Si specimen is measured before, during, and after the magnetron sputtering deposition, inducing the evolution of the elastic constants of the deposited film. Recovery of the elastic constants of the Ag film is completed within 40 min. The recovery behavior of the elastic constants is similar to that of residual stress; the recovery rate is comparable to that for residual stress.
Publisher	The Japan Society of Applied Physics
Source Title	Japanese Journal of Applied Physics
Volume (Issue)	48
Page	07GA02
Date of Issued	2009-07-21
Language	English
Handle URL	https://hdl.handle.net/11094/84480
PISSN	00214922
eISSN	13474065
NCID	AA12295836
Relation.isVersionOf	DOI (Publisher Version) https://doi.org/10.1143/JJAP.48.07GA02
Access Rights	open access
oaire:version	Accepted Manuscript
Category	学術雑誌論文 Journal Article

Resource Type	journal article
Local Type	Journal Article
DCMI Type	Text
DCTERMS.bibliographicCitation	Japanese Journal of Applied Physics. 2009, 48, p. 07GA02
DC.title	Fast recovery of elastic stiffness in Ag thin film studied by resonant-ultrasound spectroscopy
DC.creator	Nakamura, Nobutomo
	Nakashima, Takeo
	Ogi, Hirotsugu
	Hirao, Masahiko
	Nishiyama, Masayoshi
DC.publisher	The Japan Society of Applied Physics
DC.language' scheme='DCTERMS.RFC1766	English
DC.type' scheme='DCTERMS.DCMIType	Text
DCTERMS.issued' scheme='DCTERMS.W3CDTF	2009-07-21
DC.identifier	https://doi.org/10.1143/JJAP.48.07GA02
DC.description	Nobutomo Nakamura, Takeo Nakashima, Hirotsugu Ogi, Masahiko Hirao and Masayoshi Nishiyama. Fast recovery of elastic stiffness in Ag thin film studied by resonant-ultrasound spectroscopy. Japanese Journal of Applied Physics, 2009, 48(7S), 07GA02. https://doi.org/10.1143/JJAP.48.07GA02.
DCTERMS.abstract	We studied the recovery of the elastic constant of sputtered Ag films on monocrystal Si substrates by monitoring the resonance frequency of film/substrate specimens throughout the deposition process using resonant-ultrasound spectroscopy. An Ag film is deposited on a (001) Si substrate, which is located on the tripod transducer set in the sputtering chamber. The free-vibration resonance frequency of the Ag/Si specimen is measured before, during, and after the magnetron sputtering deposition, inducing the evolution of the elastic constants of the deposited film. Recovery of the elastic constants of the Ag film is completed within 40 min. The recovery behavior of the elastic constants is similar to that of residual stress; the recovery rate is comparable to that for residual stress.
DC.format	84480
citation_title	Fast recovery of elastic stiffness in Ag thin film studied by resonant-ultrasound spectroscopy
citation_author	Nakamura, Nobutomo
	Nakashima, Takeo
	Ogi, Hirotsugu
	Hirao, Masahiko
	Nishiyama, Masayoshi
citation_publisher	The Japan Society of Applied Physics
citation_language	English
citation_date	2009-07-21
citation_journal_title	Japanese Journal of Applied Physics
citation_volume	48
citation_firstpage	07GA02
citation_doi	https://doi.org/10.1143/JJAP.48.07GA02
citation_public_url	https://hdl.handle.net/11094/84480

Fast recovery of elastic stiffness in Ag thin film studied by resonant-ultrasound spectroscopy

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