Refractive index and extinction coefficient of Si at 400nm between 10 and 300K

Nagakubo, Akira; Ogi, Hirotsugu; Hirao, Masahiko

Japanese Journal of Applied Physics, 2015, 54(12), 128001-1-128001-3

Number of Access:5642025-11-25 02:19 Counts

Identifier to cite or link to this item: https://hdl.handle.net/11094/84532

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