Nearly diffraction-limited line focusing of a hard-X-ray beam with an elliptically figured mirror

Yamauchi, Kazuto; Yamamura, Kazuya; Mimura, Hidekazu; Sano, Yasuhisa; Saito, Akira; Souvorov, Alexei; Yabashi, Makina; Tamasaku, Kenji; Ishikawa, Tetsuya; Mori, Yuzo

doi:https://doi.org/10.1107/S0909049502012578

Nearly diffraction-limited line focusing of a hard-X-ray beam with an elliptically figured mirror

Yamauchi, Kazuto; Yamamura, Kazuya; Mimura, Hidekazu et al.

Journal of Synchrotron Radiation, 2002, 9(5), 313-316

Number of Access:1,017（2025-08-14 15:05 Counts）

Identifier to cite or link to this item: https://hdl.handle.net/11094/85462

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Title	Nearly diffraction-limited line focusing of a hard-X-ray beam with an elliptically figured mirror
Creator	NRID 1000010174575 1000010174575 researchmap permalink yamauchikazuto yamauchikazuto Scopus Author ID 7801509680 7801509680 CreatorName Yamauchi, Kazuto
	NRID 1000060240074 1000060240074 researchmap permalink read0014013 read0014013 Scopus Author ID 7201754767 7201754767 CreatorName Yamamura, Kazuya
	NRID 1000030362651 1000030362651 CreatorName Mimura, Hidekazu
	NRID 1000040252598 1000040252598 ORCID 0000-0002-1767-922X 0000-0002-1767-922X researchmap permalink read0042804 read0042804 Scopus Author ID 7402344818 7402344818 CreatorName Sano, Yasuhisa
	NRID 1000090294024 1000090294024 ORCID 0000-0003-3859-5575 0000-0003-3859-5575 researchmap permalink nyudo nyudo Scopus Author ID 55725475700 55725475700 CreatorName Saito, Akira
	CreatorName Souvorov, Alexei
	NRID 1000000372144 1000000372144 CreatorName Yabashi, Makina
	NRID 1000030300883 1000030300883 CreatorName Tamasaku, Kenji
	NRID 1000080159699 1000080159699 CreatorName Ishikawa, Tetsuya
	NRID 1000000029125 1000000029125 CreatorName Mori, Yuzo
Subject	elastic emission machining
	plasma chemical vaporization machining
	coherent X-rays
	submicrometre focusing
	elliptical mirrors
Description	Yamauchi, K., Yamamura, K., Mimura, H., Sano, Y., Saito, A., Souvorov, A., Yabashi, M., Tamasaku, K., Ishikawa, T. & Mori, Y. (2002). J. Synchrotron Rad. 9, 313-316.
Abstract	An elliptical mirror for X-ray microfocusing was manufactured using the new fabrication methods of elastic emission machining and plasma chemical vaporization machining. Surface profiles measured using stitching interferometry showed a maximum deviation around the ideal figure of 7 nm peak-to-valley. The mirror showed nearly diffraction-limited focusing performance, with a 200 nm line width at the focus. Wave-optical calculations, taking the measured surface profile into consideration, reproduced well the measured focusing properties both at and around the beam waist.
Publisher	International Union of Crystallography
Source Title	Journal of Synchrotron Radiation
Volume (Issue)	9(5)
Page	313-316
Date of Issued	2002-09
Language	English
Handle URL	https://hdl.handle.net/11094/85462
PISSN	09090495
NCID	AA11022317
Relation.isIdenticalTo	DOI (Publisher Version) https://doi.org/10.1107/S0909049502012578
Relation.isIdenticalTo	PMID 12200576
Access Rights	open access
CopyRight	© International Union of Crystallography
oaire:version	Version of Record
Category	学術雑誌論文 Journal Article

Resource Type	journal article
Local Type	Journal Article
DCMI Type	Text
DCTERMS.bibliographicCitation	Journal of Synchrotron Radiation. 2002, 9(5), p. 313-316
DC.title	Nearly diffraction-limited line focusing of a hard-X-ray beam with an elliptically figured mirror
DC.creator	Yamauchi, Kazuto
	Yamamura, Kazuya
	Mimura, Hidekazu
	Sano, Yasuhisa
	Saito, Akira
	Souvorov, Alexei
	Yabashi, Makina
	Tamasaku, Kenji
	Ishikawa, Tetsuya
	Mori, Yuzo
DC.publisher	International Union of Crystallography
DC.language' scheme='DCTERMS.RFC1766	English
DC.type' scheme='DCTERMS.DCMIType	Text
DCTERMS.issued' scheme='DCTERMS.W3CDTF	2002-09
DC.identifier	https://doi.org/10.1107/S0909049502012578
DC.subject	elastic emission machining
	plasma chemical vaporization machining
	coherent X-rays
	submicrometre focusing
	elliptical mirrors
DC.description	Yamauchi, K., Yamamura, K., Mimura, H., Sano, Y., Saito, A., Souvorov, A., Yabashi, M., Tamasaku, K., Ishikawa, T. & Mori, Y. (2002). J. Synchrotron Rad. 9, 313-316.
DCTERMS.abstract	An elliptical mirror for X-ray microfocusing was manufactured using the new fabrication methods of elastic emission machining and plasma chemical vaporization machining. Surface profiles measured using stitching interferometry showed a maximum deviation around the ideal figure of 7 nm peak-to-valley. The mirror showed nearly diffraction-limited focusing performance, with a 200 nm line width at the focus. Wave-optical calculations, taking the measured surface profile into consideration, reproduced well the measured focusing properties both at and around the beam waist.
DC.rights	© International Union of Crystallography
DC.format	85462
citation_title	Nearly diffraction-limited line focusing of a hard-X-ray beam with an elliptically figured mirror
citation_author	Yamauchi, Kazuto
	Yamamura, Kazuya
	Mimura, Hidekazu
	Sano, Yasuhisa
	Saito, Akira
	Souvorov, Alexei
	Yabashi, Makina
	Tamasaku, Kenji
	Ishikawa, Tetsuya
	Mori, Yuzo
citation_publisher	International Union of Crystallography
citation_language	English
citation_date	2002-09
citation_journal_title	Journal of Synchrotron Radiation
citation_volume	9
citation_issue	5
citation_firstpage	313
citation_lastpage	316
citation_doi	https://doi.org/10.1107/S0909049502012578
citation_pmid	12200576
citation_public_url	https://hdl.handle.net/11094/85462

Nearly diffraction-limited line focusing of a hard-X-ray beam with an elliptically figured mirror

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