Development of ion beam figuring system with electrostatic deflection for ultraprecise X-ray reflective optics

Yamada, Jumpei; Matsuyama, Satoshi; Sano, Yasuhisa; Yamauchi, Kazuto

doi:https://doi.org/10.1063/1.4929323

Development of ion beam figuring system with electrostatic deflection for ultraprecise X-ray reflective optics

Yamada, Jumpei; Matsuyama, Satoshi; Sano, Yasuhisa et al.

Review of Scientific Instruments, 2015, 86(9), 093103

Number of Access:645（2025-08-13 23:46 Counts）

Identifier to cite or link to this item: https://hdl.handle.net/11094/86930

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Title	Development of ion beam figuring system with electrostatic deflection for ultraprecise X-ray reflective optics
Creator	NRID 1000010845027 1000010845027 researchmap permalink J_Y190325 J_Y190325 CreatorName Yamada, Jumpei
	NRID 1000010423196 1000010423196 CreatorName Matsuyama, Satoshi
	NRID 1000040252598 1000040252598 ORCID 0000-0002-1767-922X 0000-0002-1767-922X researchmap permalink read0042804 read0042804 Scopus Author ID 7402344818 7402344818 CreatorName Sano, Yasuhisa
	NRID 1000010174575 1000010174575 researchmap permalink yamauchikazuto yamauchikazuto Scopus Author ID 7801509680 7801509680 CreatorName Yamauchi, Kazuto
Description	Jumpei Yamada, Satoshi Matsuyama, Yasuhisa Sano, and Kazuto Yamauchi, "Development of ion beam figuring system with electrostatic deflection for ultraprecise X-ray reflective optics", Review of Scientific Instruments 86, 093103 (2015) https://doi.org/10.1063/1.4929323.
Abstract	We developed an ion beam figuring system that utilizes electrostatic deflection. The system can produce an arbitrary shape by deterministically scanning the ion beam. The scan of the ion beam, which can be precisely controlled using only an electrical signal, enables us to avoid degradation of the mirror shape caused by imperfect acceleration or deceleration of a mechanically scanning stage. Additionally, this surface figuring method can easily be combined with X-ray metrology because the workpiece remains fixed during the figuring. We evaluated the figuring accuracy of the system by fabricating a plano-elliptical mirror for X-ray focusing. A mirror with a shape error of 1.4 nm root mean square (RMS) with a maximum removal depth of 992 nm, which corresponds to figuring accuracy of 0.14% RMS, was achieved. After the second shape corrections, an elliptical shape with a shape error of approximately 1 nm peak-to-valley, 0.48 nm RMS could be fabricated. Then, the mirror surface was smoothed by a low-energy ion beam. Consequently, a micro-roughness of 0.117 nm RMS, measured by atomic force microscopy, was achieved over an area of 1 × 1 μm2.
Publisher	American Institute of Physics
Source Title	Review of Scientific Instruments
Volume (Issue)	86(9)
Page	093103
Date of Issued	2015-09
Language	English
Handle URL	https://hdl.handle.net/11094/86930
PISSN	00346748
eISSN	10897623
NCID	AA00817730
Relation.isIdenticalTo	DOI (Publisher Version) https://doi.org/10.1063/1.4929323
Access Rights	open access
CopyRight	This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. This article appeared in (citation of published article) and may be found at https://doi.org/10.1063/1.4929323.
oaire:version	Version of Record
Category	学術雑誌論文 Journal Article

Resource Type	journal article
Local Type	Journal Article
DCMI Type	Text
DCTERMS.bibliographicCitation	Review of Scientific Instruments. 2015, 86(9), p. 093103
DC.title	Development of ion beam figuring system with electrostatic deflection for ultraprecise X-ray reflective optics
DC.creator	Yamada, Jumpei
	Matsuyama, Satoshi
	Sano, Yasuhisa
	Yamauchi, Kazuto
DC.publisher	American Institute of Physics
DC.language' scheme='DCTERMS.RFC1766	English
DC.type' scheme='DCTERMS.DCMIType	Text
DCTERMS.issued' scheme='DCTERMS.W3CDTF	2015-09
DC.identifier	https://doi.org/10.1063/1.4929323
DC.description	Jumpei Yamada, Satoshi Matsuyama, Yasuhisa Sano, and Kazuto Yamauchi, "Development of ion beam figuring system with electrostatic deflection for ultraprecise X-ray reflective optics", Review of Scientific Instruments 86, 093103 (2015) https://doi.org/10.1063/1.4929323.
DCTERMS.abstract	We developed an ion beam figuring system that utilizes electrostatic deflection. The system can produce an arbitrary shape by deterministically scanning the ion beam. The scan of the ion beam, which can be precisely controlled using only an electrical signal, enables us to avoid degradation of the mirror shape caused by imperfect acceleration or deceleration of a mechanically scanning stage. Additionally, this surface figuring method can easily be combined with X-ray metrology because the workpiece remains fixed during the figuring. We evaluated the figuring accuracy of the system by fabricating a plano-elliptical mirror for X-ray focusing. A mirror with a shape error of 1.4 nm root mean square (RMS) with a maximum removal depth of 992 nm, which corresponds to figuring accuracy of 0.14% RMS, was achieved. After the second shape corrections, an elliptical shape with a shape error of approximately 1 nm peak-to-valley, 0.48 nm RMS could be fabricated. Then, the mirror surface was smoothed by a low-energy ion beam. Consequently, a micro-roughness of 0.117 nm RMS, measured by atomic force microscopy, was achieved over an area of 1 × 1 μm2.
DC.rights	This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. This article appeared in (citation of published article) and may be found at https://doi.org/10.1063/1.4929323.
DC.format	86930
citation_title	Development of ion beam figuring system with electrostatic deflection for ultraprecise X-ray reflective optics
citation_author	Yamada, Jumpei
	Matsuyama, Satoshi
	Sano, Yasuhisa
	Yamauchi, Kazuto
citation_publisher	American Institute of Physics
citation_language	English
citation_date	2015-09
citation_journal_title	Review of Scientific Instruments
citation_volume	86
citation_issue	9
citation_firstpage	093103
citation_doi	https://doi.org/10.1063/1.4929323
citation_public_url	https://hdl.handle.net/11094/86930

Development of ion beam figuring system with electrostatic deflection for ultraprecise X-ray reflective optics

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