Development of speckle-free channel-cut crystal optics using plasma chemical vaporization machining for coherent x-ray applications

Hirano, Takashi; Osaka, Taito; Sano, Yasuhisa; Inubushi, Yuichi; Matsuyama, Satoshi; Tono, Kensuke; Ishikawa, Tetsuya; Yabashi, Makina; Yamauchi, Kazuto

doi:https://doi.org/10.1063/1.4954731

Development of speckle-free channel-cut crystal optics using plasma chemical vaporization machining for coherent x-ray applications

Hirano, Takashi; Osaka, Taito; Sano, Yasuhisa et al.

Review of Scientific Instruments, 2016, 87(6), 063118

Number of Access:923（2025-10-08 09:42 Counts）

Identifier to cite or link to this item: https://hdl.handle.net/11094/86949

Link to primary information

File	Format	Terms of use	Size	Views	Date.Available	Description	information
153339_1	pdf	None	3.17 MB	214	2022.03.28

Item Information

Output File Export EndNote Basic Export Mendeley

Title	Development of speckle-free channel-cut crystal optics using plasma chemical vaporization machining for coherent x-ray applications
Creator	CreatorName Hirano, Takashi
	NRID 1000070782887 1000070782887 CreatorName Osaka, Taito
	NRID 1000040252598 1000040252598 ORCID 0000-0002-1767-922X 0000-0002-1767-922X researchmap permalink read0042804 read0042804 Scopus Author ID 7402344818 7402344818 CreatorName Sano, Yasuhisa
	NRID 1000040506250 1000040506250 CreatorName Inubushi, Yuichi
	NRID 1000010423196 1000010423196 CreatorName Matsuyama, Satoshi
	NRID 1000000353508 1000000353508 CreatorName Tono, Kensuke
	NRID 1000080159699 1000080159699 CreatorName Ishikawa, Tetsuya
	NRID 1000000372144 1000000372144 CreatorName Yabashi, Makina
	NRID 1000010174575 1000010174575 researchmap permalink yamauchikazuto yamauchikazuto Scopus Author ID 7801509680 7801509680 CreatorName Yamauchi, Kazuto
Description	Takashi Hirano, Taito Osaka, Yasuhisa Sano, Yuichi Inubushi, Satoshi Matsuyama, Kensuke Tono, Tetsuya Ishikawa, Makina Yabashi, and Kazuto Yamauchi, "Development of speckle-free channel-cut crystal optics using plasma chemical vaporization machining for coherent x-ray applications", Review of Scientific Instruments 87, 063118 (2016) https://doi.org/10.1063/1.4954731.
Abstract	We have developed a method of fabricating speckle-free channel-cut crystal optics with plasma chemical vaporization machining, an etching method using atmospheric-pressure plasma, for coherent X-ray applications. We investigated the etching characteristics to silicon crystals and achieved a small surface roughness of less than 1 nm rms at a removal depth of >10 μm, which satisfies the requirements for eliminating subsurface damage while suppressing diffuse scattering from rough surfaces. We applied this method for fabricating channel-cut Si(220) crystals for a hard X-ray split-and-delay optical system and confirmed that the crystals provided speckle-free reflection profiles under coherent X-ray illumination.
Publisher	American Institute of Physics
Source Title	Review of Scientific Instruments
Volume (Issue)	87(6)
Page	063118
Date of Issued	2016-06
Language	English
Handle URL	https://hdl.handle.net/11094/86949
PISSN	00346748
eISSN	10897623
NCID	AA00693547
Relation.isIdenticalTo	DOI (Publisher Version) https://doi.org/10.1063/1.4954731
Access Rights	open access
CopyRight	This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. This article appeared in (citation of published article) and may be found at https://doi.org/10.1063/1.4954731.
oaire:version	Version of Record
Category	学術雑誌論文 Journal Article

Resource Type	journal article
Local Type	Journal Article
DCMI Type	Text
DCTERMS.bibliographicCitation	Review of Scientific Instruments. 2016, 87(6), p. 063118
DC.title	Development of speckle-free channel-cut crystal optics using plasma chemical vaporization machining for coherent x-ray applications
DC.creator	Hirano, Takashi
	Osaka, Taito
	Sano, Yasuhisa
	Inubushi, Yuichi
	Matsuyama, Satoshi
	Tono, Kensuke
	Ishikawa, Tetsuya
	Yabashi, Makina
	Yamauchi, Kazuto
DC.publisher	American Institute of Physics
DC.language' scheme='DCTERMS.RFC1766	English
DC.type' scheme='DCTERMS.DCMIType	Text
DCTERMS.issued' scheme='DCTERMS.W3CDTF	2016-06
DC.identifier	https://doi.org/10.1063/1.4954731
DC.description	Takashi Hirano, Taito Osaka, Yasuhisa Sano, Yuichi Inubushi, Satoshi Matsuyama, Kensuke Tono, Tetsuya Ishikawa, Makina Yabashi, and Kazuto Yamauchi, "Development of speckle-free channel-cut crystal optics using plasma chemical vaporization machining for coherent x-ray applications", Review of Scientific Instruments 87, 063118 (2016) https://doi.org/10.1063/1.4954731.
DCTERMS.abstract	We have developed a method of fabricating speckle-free channel-cut crystal optics with plasma chemical vaporization machining, an etching method using atmospheric-pressure plasma, for coherent X-ray applications. We investigated the etching characteristics to silicon crystals and achieved a small surface roughness of less than 1 nm rms at a removal depth of >10 μm, which satisfies the requirements for eliminating subsurface damage while suppressing diffuse scattering from rough surfaces. We applied this method for fabricating channel-cut Si(220) crystals for a hard X-ray split-and-delay optical system and confirmed that the crystals provided speckle-free reflection profiles under coherent X-ray illumination.
DC.rights	This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. This article appeared in (citation of published article) and may be found at https://doi.org/10.1063/1.4954731.
DC.format	86949
citation_title	Development of speckle-free channel-cut crystal optics using plasma chemical vaporization machining for coherent x-ray applications
citation_author	Hirano, Takashi
	Osaka, Taito
	Sano, Yasuhisa
	Inubushi, Yuichi
	Matsuyama, Satoshi
	Tono, Kensuke
	Ishikawa, Tetsuya
	Yabashi, Makina
	Yamauchi, Kazuto
citation_publisher	American Institute of Physics
citation_language	English
citation_date	2016-06
citation_journal_title	Review of Scientific Instruments
citation_volume	87
citation_issue	6
citation_firstpage	063118
citation_doi	https://doi.org/10.1063/1.4954731
citation_public_url	https://hdl.handle.net/11094/86949

Development of speckle-free channel-cut crystal optics using plasma chemical vaporization machining for coherent x-ray applications

Link to primary information

Item Information

Show details