Surface finishing method using plasma chemical vaporization machining for narrow channel walls of x-ray crystal monochromators

Hirano, Takashi; Morioka, Yuki; Matsumura, Shotaro; Sano, Yasuhisa; Osaka, Taito; Matsuyama, Satoshi; Yabashi, Makina; Yamauchi, Kazuto

doi:https://doi.org/10.20965/ijat.2019.p0246

Surface finishing method using plasma chemical vaporization machining for narrow channel walls of x-ray crystal monochromators

Hirano, Takashi; Morioka, Yuki; Matsumura, Shotaro et al.

International Journal of Automation Technology, 2019, 13(2), 246-253

Number of Access:876（2025-10-08 09:42 Counts）

Identifier to cite or link to this item: https://hdl.handle.net/11094/86957

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Title	Surface finishing method using plasma chemical vaporization machining for narrow channel walls of x-ray crystal monochromators
Creator	CreatorName Hirano, Takashi
	CreatorName Morioka, Yuki
	CreatorName Matsumura, Shotaro
	NRID 1000040252598 1000040252598 ORCID 0000-0002-1767-922X 0000-0002-1767-922X researchmap permalink read0042804 read0042804 Scopus Author ID 7402344818 7402344818 CreatorName Sano, Yasuhisa
	NRID 1000070782887 1000070782887 CreatorName Osaka, Taito
	NRID 1000010423196 1000010423196 CreatorName Matsuyama, Satoshi
	NRID 1000000372144 1000000372144 CreatorName Yabashi, Makina
	NRID 1000010174575 1000010174575 researchmap permalink yamauchikazuto yamauchikazuto Scopus Author ID 7801509680 7801509680 CreatorName Yamauchi, Kazuto
Subject	X-ray optical device
	channel-cut crystal
	X-ray free-electron laser
	atmospheric-pressure plasma
	damage-free etching
Description	Takashi Hirano, Yuki Morioka, Shotaro Matsumura, Yasuhisa Sano, Taito Osaka, Satoshi Matsuyama, Makina Yabashi, and Kazuto Yamauchi, “Surface Finishing Method Using Plasma Chemical Vaporization Machining for Narrow Channel Walls of X-Ray Crystal Monochromators,” Int. J. Automation Technol., Vol.13, No.2, pp. 246-253, 2019.
Abstract	Channel-cut Si crystals are useful optical devices for providing monochromatic X-ray beams with extreme angular stability. Owing to difficulties in the high-precision surface finishing of narrow-channel inner walls of the crystals, typical channel-cut crystals have considerable residual subsurface crystal damage and/or roughness on their channel-wall reflection surfaces that decrease intensity and distort the wavefronts of the reflected X-rays. This paper proposes a highprecision surface finishing method for the narrowchannel inner walls based on plasma chemical vaporization machining, which is a local etching technique using atmospheric-pressure plasma. Cylinderand nozzle-shaped electrodes were designed for channel widths of more than 5 and 3 mm, respectively. We optimized process conditions for each electrode using commercial Si wafers, and obtained a removal depth of 10 μm with a surface flatness and roughness of less than 1 μm and 1 nmRMS, respectively, which should allow the damaged layers to be fully removed while maintaining the wavefront of coherent X-rays.
Publisher	Fuji Technology Press
Source Title	International Journal of Automation Technology
Volume (Issue)	13(2)
Page	246-253
Date of Issued	2019-03-05
Language	English
Handle URL	https://hdl.handle.net/11094/86957
PISSN	18817629
eISSN	18838022
Relation.isIdenticalTo	DOI (Publisher Version) https://doi.org/10.20965/ijat.2019.p0246
Access Rights	open access
CopyRight	This article is licensed under a Creative Commons Attribution-NoDerivatives 4.0 International License.
oaire:version	Version of Record
Category	学術雑誌論文 Journal Article

Resource Type	journal article
Local Type	Journal Article
DCMI Type	Text
DCTERMS.bibliographicCitation	International Journal of Automation Technology. 2019, 13(2), p. 246-253
DC.title	Surface finishing method using plasma chemical vaporization machining for narrow channel walls of x-ray crystal monochromators
DC.creator	Hirano, Takashi
	Morioka, Yuki
	Matsumura, Shotaro
	Sano, Yasuhisa
	Osaka, Taito
	Matsuyama, Satoshi
	Yabashi, Makina
	Yamauchi, Kazuto
DC.publisher	Fuji Technology Press
DC.language' scheme='DCTERMS.RFC1766	English
DC.type' scheme='DCTERMS.DCMIType	Text
DCTERMS.issued' scheme='DCTERMS.W3CDTF	2019-03-05
DC.identifier	https://doi.org/10.20965/ijat.2019.p0246
DC.subject	X-ray optical device
	channel-cut crystal
	X-ray free-electron laser
	atmospheric-pressure plasma
	damage-free etching
DC.description	Takashi Hirano, Yuki Morioka, Shotaro Matsumura, Yasuhisa Sano, Taito Osaka, Satoshi Matsuyama, Makina Yabashi, and Kazuto Yamauchi, “Surface Finishing Method Using Plasma Chemical Vaporization Machining for Narrow Channel Walls of X-Ray Crystal Monochromators,” Int. J. Automation Technol., Vol.13, No.2, pp. 246-253, 2019.
DCTERMS.abstract	Channel-cut Si crystals are useful optical devices for providing monochromatic X-ray beams with extreme angular stability. Owing to difficulties in the high-precision surface finishing of narrow-channel inner walls of the crystals, typical channel-cut crystals have considerable residual subsurface crystal damage and/or roughness on their channel-wall reflection surfaces that decrease intensity and distort the wavefronts of the reflected X-rays. This paper proposes a highprecision surface finishing method for the narrowchannel inner walls based on plasma chemical vaporization machining, which is a local etching technique using atmospheric-pressure plasma. Cylinderand nozzle-shaped electrodes were designed for channel widths of more than 5 and 3 mm, respectively. We optimized process conditions for each electrode using commercial Si wafers, and obtained a removal depth of 10 μm with a surface flatness and roughness of less than 1 μm and 1 nmRMS, respectively, which should allow the damaged layers to be fully removed while maintaining the wavefront of coherent X-rays.
DC.rights	This article is licensed under a Creative Commons Attribution-NoDerivatives 4.0 International License.
DC.format	86957
citation_title	Surface finishing method using plasma chemical vaporization machining for narrow channel walls of x-ray crystal monochromators
citation_author	Hirano, Takashi
	Morioka, Yuki
	Matsumura, Shotaro
	Sano, Yasuhisa
	Osaka, Taito
	Matsuyama, Satoshi
	Yabashi, Makina
	Yamauchi, Kazuto
citation_publisher	Fuji Technology Press
citation_language	English
citation_date	2019-03-05
citation_journal_title	International Journal of Automation Technology
citation_volume	13
citation_issue	2
citation_firstpage	246
citation_lastpage	253
citation_doi	https://doi.org/10.20965/ijat.2019.p0246
citation_public_url	https://hdl.handle.net/11094/86957

Surface finishing method using plasma chemical vaporization machining for narrow channel walls of x-ray crystal monochromators

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