High-throughput deterministic plasma etching using array-type plasma generator system

Sano, Yasuhisa; Nishida, Ken; Asada, Ryohei; Okayama, Shinya; Toh, Daisetsu; Matsuyama, Satoshi; Yamauchi, Kazuto

doi:https://doi.org/10.1063/5.0071623

High-throughput deterministic plasma etching using array-type plasma generator system

Sano, Yasuhisa; Nishida, Ken; Asada, Ryohei et al.

Review of Scientific Instruments, 2021, 92(12), 125107

Number of Access:836（2025-10-08 11:29 Counts）

Identifier to cite or link to this item: https://hdl.handle.net/11094/86961

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Title	High-throughput deterministic plasma etching using array-type plasma generator system
Creator	NRID 1000040252598 1000040252598 ORCID 0000-0002-1767-922X 0000-0002-1767-922X researchmap permalink read0042804 read0042804 Scopus Author ID 7402344818 7402344818 CreatorName Sano, Yasuhisa
	CreatorName Nishida, Ken
	CreatorName Asada, Ryohei
	CreatorName Okayama, Shinya
	NRID 1000070910678 1000070910678 researchmap permalink D-Toh D-Toh Scopus Author ID 57190948930 57190948930 CreatorName Toh, Daisetsu
	NRID 1000010423196 1000010423196 CreatorName Matsuyama, Satoshi
	NRID 1000010174575 1000010174575 researchmap permalink yamauchikazuto yamauchikazuto Scopus Author ID 7801509680 7801509680 CreatorName Yamauchi, Kazuto
Description	Yasuhisa Sano, Ken Nishida, Ryohei Asada, Shinya Okayama, Daisetsu Toh, Satoshi Matsuyama, and Kazuto Yamauchi, "High-throughput deterministic plasma etching using array-type plasma generator system", Review of Scientific Instruments 92, 125107 (2021), https://doi.org/10.1063/5.0071623.
Abstract	A deterministic processing method is a high-precision finishing method, where the to-be-removed amount of material at each point of the work surface is calculated based on an accurately measured present surface shape and is removed precisely using a numerically controlled (NC) processing system. Although this method has achieved nanometer-scale accuracy, the method requires considerable time to scan the work surface, leading to low productivity. Therefore, using an individual on-off controllable array-type plasma generator covering the entire work surface, enabling simultaneous NC plasma processing is proposed herein. A novel intermittent gas flow system was constructed using cyclic on-off control of the gas supply and exhaust valves instead of the commonly used continuous gas flow to achieve uniform in-plane plasma etching. It was found that uniform removal could be achieved by combining it with a pulse-modulated high-frequency power supply and setting the plasma generation time in one cycle to be sufficiently short. Furthermore, a power control approach was developed for maintaining a constant plasma state, even while varying the plasma-generating array elements, which resulted in a demonstration experiment of NC plasma etching that successfully reduced the thickness variation of a silicon substrate.
Publisher	American Institute of Physics
Source Title	Review of Scientific Instruments
Volume (Issue)	92(12)
Page	125107
Date of Issued	2021-12-16
Language	English
Handle URL	https://hdl.handle.net/11094/86961
PISSN	00346748
eISSN	10897623
NCID	AA00817730
Relation.isIdenticalTo	DOI (Publisher Version) https://doi.org/10.1063/5.0071623
Relation.isIdenticalTo	PMID 34972458
Access Rights	open access
CopyRight	This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. This article appeared in (citation of published article) and may be found at https://doi.org/10.1063/5.0071623.
oaire:version	Version of Record
Category	学術雑誌論文 Journal Article

Resource Type	journal article
Local Type	Journal Article
DCMI Type	Text
DCTERMS.bibliographicCitation	Review of Scientific Instruments. 2021, 92(12), p. 125107
DC.title	High-throughput deterministic plasma etching using array-type plasma generator system
DC.creator	Sano, Yasuhisa
	Nishida, Ken
	Asada, Ryohei
	Okayama, Shinya
	Toh, Daisetsu
	Matsuyama, Satoshi
	Yamauchi, Kazuto
DC.publisher	American Institute of Physics
DC.language' scheme='DCTERMS.RFC1766	English
DC.type' scheme='DCTERMS.DCMIType	Text
DCTERMS.issued' scheme='DCTERMS.W3CDTF	2021-12-16
DC.identifier	https://doi.org/10.1063/5.0071623
DC.description	Yasuhisa Sano, Ken Nishida, Ryohei Asada, Shinya Okayama, Daisetsu Toh, Satoshi Matsuyama, and Kazuto Yamauchi, "High-throughput deterministic plasma etching using array-type plasma generator system", Review of Scientific Instruments 92, 125107 (2021), https://doi.org/10.1063/5.0071623.
DCTERMS.abstract	A deterministic processing method is a high-precision finishing method, where the to-be-removed amount of material at each point of the work surface is calculated based on an accurately measured present surface shape and is removed precisely using a numerically controlled (NC) processing system. Although this method has achieved nanometer-scale accuracy, the method requires considerable time to scan the work surface, leading to low productivity. Therefore, using an individual on-off controllable array-type plasma generator covering the entire work surface, enabling simultaneous NC plasma processing is proposed herein. A novel intermittent gas flow system was constructed using cyclic on-off control of the gas supply and exhaust valves instead of the commonly used continuous gas flow to achieve uniform in-plane plasma etching. It was found that uniform removal could be achieved by combining it with a pulse-modulated high-frequency power supply and setting the plasma generation time in one cycle to be sufficiently short. Furthermore, a power control approach was developed for maintaining a constant plasma state, even while varying the plasma-generating array elements, which resulted in a demonstration experiment of NC plasma etching that successfully reduced the thickness variation of a silicon substrate.
DC.rights	This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. This article appeared in (citation of published article) and may be found at https://doi.org/10.1063/5.0071623.
DC.format	86961
citation_title	High-throughput deterministic plasma etching using array-type plasma generator system
citation_author	Sano, Yasuhisa
	Nishida, Ken
	Asada, Ryohei
	Okayama, Shinya
	Toh, Daisetsu
	Matsuyama, Satoshi
	Yamauchi, Kazuto
citation_publisher	American Institute of Physics
citation_language	English
citation_date	2021-12-16
citation_journal_title	Review of Scientific Instruments
citation_volume	92
citation_issue	12
citation_firstpage	125107
citation_doi	https://doi.org/10.1063/5.0071623
citation_pmid	34972458
citation_public_url	https://hdl.handle.net/11094/86961

High-throughput deterministic plasma etching using array-type plasma generator system

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