Efficient focusing of hard x rays to 25 nm by a total reflection mirror

Mimura, Hidekazu; Yumoto, Hirokatsu; Matsuyama, Satoshi; Sano, Yasuhisa; Yamamura, Kazuya; Mori, Yuzo; Yabashi, Makina; Nishino, Yoshinori; Tamasaku, Kenji; Ishikawa, Tetsuya; Yamauchi, Kazuto

doi:https://doi.org/10.1063/1.2436469

Efficient focusing of hard x rays to 25 nm by a total reflection mirror

Mimura, Hidekazu; Yumoto, Hirokatsu; Matsuyama, Satoshi et al.

Applied Physics Letters, 2007, 90(5), 051903

Number of Access:856（2025-08-15 10:59 Counts）

Identifier to cite or link to this item: https://hdl.handle.net/11094/86972

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Title	Efficient focusing of hard x rays to 25 nm by a total reflection mirror
Creator	NRID 1000030362651 1000030362651 CreatorName Mimura, Hidekazu
	NRID 1000020423197 1000020423197 CreatorName Yumoto, Hirokatsu
	NRID 1000010423196 1000010423196 CreatorName Matsuyama, Satoshi
	NRID 1000040252598 1000040252598 ORCID 0000-0002-1767-922X 0000-0002-1767-922X researchmap permalink read0042804 read0042804 Scopus Author ID 7402344818 7402344818 CreatorName Sano, Yasuhisa
	NRID 1000060240074 1000060240074 researchmap permalink read0014013 read0014013 Scopus Author ID 7201754767 7201754767 CreatorName Yamamura, Kazuya
	NRID 1000000029125 1000000029125 CreatorName Mori, Yuzo
	NRID 1000000372144 1000000372144 CreatorName Yabashi, Makina
	NRID 1000040392063 1000040392063 CreatorName Nishino, Yoshinori
	NRID 1000030300883 1000030300883 CreatorName Tamasaku, Kenji
	NRID 1000080159699 1000080159699 CreatorName Ishikawa, Tetsuya
	NRID 1000010174575 1000010174575 researchmap permalink yamauchikazuto yamauchikazuto Scopus Author ID 7801509680 7801509680 CreatorName Yamauchi, Kazuto
Description	Hidekazu Mimura, Hirokatsu Yumoto, et al. "Efficient focusing of hard x rays to 25nm by a total reflection mirror", Appl. Phys. Lett. 90(5), 051903 (2007) https://doi.org/10.1063/1.2436469.
Abstract	Nanofocused x rays are indispensable because they can provide high spatial resolution and high sensitivity for x-ray nanoscopy/spectroscopy. A focusing system using total reflection mirrors is one of the most promising methods for producing nanofocused x rays due to its high efficiency and energy-tunable focusing. The authors have developed a fabrication system for hard x-ray mirrors by developing elastic emission machining, microstitching interferometry, and relative angle determinable stitching interferometry. By using an ultraprecisely figured mirror, they realized hard x-ray line focusing with a beam width of 25 nm at 15 keV. The focusing test was performed at the 1-km -long beamline of SPring-8. © 2007 American Institute of Physics.
Publisher	American Institute of Physics
Source Title	Applied Physics Letters
Volume (Issue)	90(5)
Page	051903
Date of Issued	2007-01-29
Language	English
Handle URL	https://hdl.handle.net/11094/86972
PISSN	00036951
eISSN	10773118
NCID	AA00543431
NCID	AA11868096
Relation.isIdenticalTo	DOI (Publisher Version) https://doi.org/10.1063/1.2436469
Access Rights	open access
CopyRight	This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. This article appeared in Appl. Phys. Lett. 90(5), 051903 (2007) and may be found at https://doi.org/10.1063/1.2436469.
oaire:version	Version of Record
Category	学術雑誌論文 Journal Article

Resource Type	journal article
Local Type	Journal Article
DCMI Type	Text
DCTERMS.bibliographicCitation	Applied Physics Letters. 2007, 90(5), p. 051903
DC.title	Efficient focusing of hard x rays to 25 nm by a total reflection mirror
DC.creator	Mimura, Hidekazu
	Yumoto, Hirokatsu
	Matsuyama, Satoshi
	Sano, Yasuhisa
	Yamamura, Kazuya
	Mori, Yuzo
	Yabashi, Makina
	Nishino, Yoshinori
	Tamasaku, Kenji
	Ishikawa, Tetsuya
	Yamauchi, Kazuto
DC.publisher	American Institute of Physics
DC.language' scheme='DCTERMS.RFC1766	English
DC.type' scheme='DCTERMS.DCMIType	Text
DCTERMS.issued' scheme='DCTERMS.W3CDTF	2007-01-29
DC.identifier	https://doi.org/10.1063/1.2436469
DC.description	Hidekazu Mimura, Hirokatsu Yumoto, et al. "Efficient focusing of hard x rays to 25nm by a total reflection mirror", Appl. Phys. Lett. 90(5), 051903 (2007) https://doi.org/10.1063/1.2436469.
DCTERMS.abstract	Nanofocused x rays are indispensable because they can provide high spatial resolution and high sensitivity for x-ray nanoscopy/spectroscopy. A focusing system using total reflection mirrors is one of the most promising methods for producing nanofocused x rays due to its high efficiency and energy-tunable focusing. The authors have developed a fabrication system for hard x-ray mirrors by developing elastic emission machining, microstitching interferometry, and relative angle determinable stitching interferometry. By using an ultraprecisely figured mirror, they realized hard x-ray line focusing with a beam width of 25 nm at 15 keV. The focusing test was performed at the 1-km -long beamline of SPring-8. © 2007 American Institute of Physics.
DC.rights	This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. This article appeared in Appl. Phys. Lett. 90(5), 051903 (2007) and may be found at https://doi.org/10.1063/1.2436469.
DC.format	86972
citation_title	Efficient focusing of hard x rays to 25 nm by a total reflection mirror
citation_author	Mimura, Hidekazu
	Yumoto, Hirokatsu
	Matsuyama, Satoshi
	Sano, Yasuhisa
	Yamamura, Kazuya
	Mori, Yuzo
	Yabashi, Makina
	Nishino, Yoshinori
	Tamasaku, Kenji
	Ishikawa, Tetsuya
	Yamauchi, Kazuto
citation_publisher	American Institute of Physics
citation_language	English
citation_date	2007-01-29
citation_journal_title	Applied Physics Letters
citation_volume	90
citation_issue	5
citation_firstpage	051903
citation_doi	https://doi.org/10.1063/1.2436469
citation_public_url	https://hdl.handle.net/11094/86972

Efficient focusing of hard x rays to 25 nm by a total reflection mirror

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