EEM(Elastic Emission Machining)によるSi(001)表面の平坦化（第2報） : 加工表面の原子像観察と構造評価

山内, 和人; 三村, 秀和; 久保田, 章亀 他

精密工学会誌論文集, 2004, 70(4), 547-551

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Identifier to cite or link to this item: https://hdl.handle.net/11094/86993

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Title
EEM(Elastic Emission Machining)によるSi(001)表面の平坦化（第2報） : 加工表面の原子像観察と構造評価
Flattening of Si (001) Surface by EEM (Elastic Emission Machining) : Atomic Structure Identification of Processed Surface
Creator
NRID
1000010174575 1000010174575
researchmap permalink
yamauchikazuto yamauchikazuto
Scopus Author ID
7801509680 7801509680
CreatorName
山内, 和人
NRID
1000030362651 1000030362651
CreatorName
三村, 秀和
NRID
1000080404325 1000080404325
CreatorName
久保田, 章亀
NRID
1000010324807 1000010324807
ORCID
0000-0003-2030-8291 0000-0003-2030-8291
researchmap permalink
read0054777 read0054777
Scopus Author ID
57197794262 57197794262
CreatorName
有馬, 健太
NRID
1000050273579 1000050273579
researchmap permalink
read0185268 read0185268
Scopus Author ID
35513238700 35513238700
CreatorName
稲垣, 耕司
NRID
1000090152008 1000090152008
researchmap permalink
endo5352 endo5352
Scopus Author ID
7402712908 7402712908
CreatorName
遠藤, 勝義
NRID
1000000029125 1000000029125
CreatorName
森, 勇藏
Subject
EEM
ultraprecision machining
atomic-level flatness
Si(001) surface
Hydrogen-terminated Si surface
AFM (Atomic Force Microscope)
STM (Scanning Tunneling Microscope)
Description
山内 和人, 三村 秀和, 久保田 章亀, 有馬 健太, 稲垣 耕司, 遠藤 勝義, 森 勇藏, EEM(Elastic Emission Machining)によるSi(001)表面の平坦化 (第2報), 精密工学会誌論文集, 2004, 70 巻, 4 号, p. 547-551, https://doi.org/10.2493/jspe.70.547.
Abstract
Ultraprecision surface preparation techniques to make atomically flat semiconductor surfaces are strongly demanded toward the next-generation semiconductor technology age including nanotechnology age, in which extremely integrated and functionally enhanced devices will be realized. Particularly, Si(001) surface is the most important and widely utilized surface because of the controllability of the interfacial electronic state density at the surface oxidized film. This will be the case into future nanotechnology age. However, Si(001) surface is the most difficult surface to be flattened, and no industrially promising method exists. The only possible technique is a heating method in ultra-high vacuum and is unfortunately not useful from viewpoints of industrial applications. In this work, a new EEM (elastic emission machining) system is developed and tried to apply to the preparation of ultrasmooth Si(001) surface. Processed surfaces are observed and characterized by AFM (atomic force microscope), STM (scanning tunneling microscope) and LEED (low energy electron diffraction). Obtained STM images show that EEM surfaces have an atomic-level flatness, and about 95% of a extended area having a dimension of 100nm×100nm is constructed by only three atomic layers having a structure of 1×1 surface lattice.
Publisher
精密工学会
Source Title
精密工学会誌論文集
Volume (Issue)
70(4)
Page
547-551
Date of Issued
2004-04-05
Language
Japanese
Handle URL
https://hdl.handle.net/11094/86993
PISSN
13488724
eISSN
18818722
NCID
AA11966630
AA12074837
Relation.isIdenticalTo
DOI (Publisher Version)
https://doi.org/10.2493/jspe.70.547
Access Rights
open access
oaire:version
Version of Record
Category
学術雑誌論文 Journal Article