Microstructural and Phase Analysis of Zirconium and Copper Binary Thin Film Sputtered by using Elemental Composite Targets

Kondoh, Katsuyoshi; Fujita, Junji; Umeda, Junko; Imai, Hisashi; Serikawa, Tadashi

doi:https://doi.org/10.18910/9477

Microstructural and Phase Analysis of Zirconium and Copper Binary Thin Film Sputtered by using Elemental Composite Targets

Kondoh, Katsuyoshi; Fujita, Junji; Umeda, Junko et al.

Transactions of JWRI, 2008, 37(2), 33-36

Number of Access:394（2025-08-29 01:37 Counts）

Identifier to cite or link to this item: https://doi.org/10.18910/9477

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Title	Microstructural and Phase Analysis of Zirconium and Copper Binary Thin Film Sputtered by using Elemental Composite Targets
Creator	NRID 1000050345138 1000050345138 researchmap permalink kondoh kondoh Scopus Author ID 9942942300 9942942300 CreatorName Kondoh, Katsuyoshi
	CreatorName Fujita, Junji
	NRID 1000050345162 1000050345162 researchmap permalink umeda umeda Scopus Author ID 23478776500 23478776500 ORCID 0000-0001-8678-9708 0000-0001-8678-9708 CreatorName Umeda, Junko
	NRID 1000030452379 1000030452379 CreatorName Imai, Hisashi
	NRID 1000010345168 1000010345168 CreatorName Serikawa, Tadashi
Subject	RF-sputtering
	elemental composite target
	Zr-Cu binary film
	crystallization
	corrosion resistance
	standard electrode potential
Abstract	Zr-Cu amorphous films were prepared by Radio-Frequency (RF) magnetron sputtering on glass substrates using two kinds of elemental composite targets; Cu chips on Zr plate and Zr chips on Cu plate. It was easy to control precisely the chemical compositions of sputtered films by selecting the chip metal and the number of chips. It is possible to estimate accurately the film compositions by using the sputtered area and the deposition rate of Cu and Zr. XRD analysis on every as-sputtered film showed the broadened pattern. The Zr-rich composition film, however, revealed a small peak at the diffraction angle of 2θ=35°, and the Cu-rich one indicated it at 2θ=43°. TEM and electron diffraction analysis on the former also showed the main Zr ring patterns and its streaks. When annealing each specimen at 723K in Argon gas, it was found that the former and the latter had a crystallization peak for Zr and Cu at 2θ=35° and 43°, respectively. A Zr-rich composition film with Cu content of 34at% or less showed good corrosion resistance in a salt spray test. On the other hand, a Cu-rich one with 74at% Cu or more was poor. This was because Zr had a higher passivation causing the spontaneous formation of a hard non-reactive surface film that inhibited further corrosion than Cu.
Publisher	大阪大学接合科学研究所
	オオサカダイガクセツゴウカガクケンキュウジョ
	Joining and Welding Research Institute, Osaka University
Source Title	Transactions of JWRI
Volume (Issue)	37(2)
Page	33-36
Date of Issued	2008-12
Language	English
Handle URL	https://hdl.handle.net/11094/9477
DOI	https://doi.org/10.18910/9477
PISSN	03874508
NCID	AA00867058
Access Rights	open access
oaire:version	Version of Record
Category	紀要論文 Departmental Bulletin Paper
Category	Transactions of JWRI / Vol.37 No.2 (2008-12)

Resource Type	departmental bulletin paper
Local Type	Departmental Bulletin Paper
DCMI Type	Text
DCTERMS.bibliographicCitation	Transactions of JWRI. 2008, 37(2), p. 33-36
DC.title	Microstructural and Phase Analysis of Zirconium and Copper Binary Thin Film Sputtered by using Elemental Composite Targets
DC.creator	Kondoh, Katsuyoshi
	Fujita, Junji
	Umeda, Junko
	Imai, Hisashi
	Serikawa, Tadashi
DC.publisher	大阪大学接合科学研究所
	オオサカダイガクセツゴウカガクケンキュウジョ
	Joining and Welding Research Institute, Osaka University
DC.language' scheme='DCTERMS.RFC1766	English
DC.type' scheme='DCTERMS.DCMIType	Text
DCTERMS.issued' scheme='DCTERMS.W3CDTF	2008-12
DC.subject	RF-sputtering
	elemental composite target
	Zr-Cu binary film
	crystallization
	corrosion resistance
	standard electrode potential
DCTERMS.abstract	Zr-Cu amorphous films were prepared by Radio-Frequency (RF) magnetron sputtering on glass substrates using two kinds of elemental composite targets; Cu chips on Zr plate and Zr chips on Cu plate. It was easy to control precisely the chemical compositions of sputtered films by selecting the chip metal and the number of chips. It is possible to estimate accurately the film compositions by using the sputtered area and the deposition rate of Cu and Zr. XRD analysis on every as-sputtered film showed the broadened pattern. The Zr-rich composition film, however, revealed a small peak at the diffraction angle of 2θ=35°, and the Cu-rich one indicated it at 2θ=43°. TEM and electron diffraction analysis on the former also showed the main Zr ring patterns and its streaks. When annealing each specimen at 723K in Argon gas, it was found that the former and the latter had a crystallization peak for Zr and Cu at 2θ=35° and 43°, respectively. A Zr-rich composition film with Cu content of 34at% or less showed good corrosion resistance in a salt spray test. On the other hand, a Cu-rich one with 74at% Cu or more was poor. This was because Zr had a higher passivation causing the spontaneous formation of a hard non-reactive surface film that inhibited further corrosion than Cu.
DC.identifier	10.18910/9477
DC.format	9477
citation_title	Microstructural and Phase Analysis of Zirconium and Copper Binary Thin Film Sputtered by using Elemental Composite Targets
citation_author	Kondoh, Katsuyoshi
	Fujita, Junji
	Umeda, Junko
	Imai, Hisashi
	Serikawa, Tadashi
citation_publisher	大阪大学接合科学研究所
citation_language	English
citation_date	2008-12
citation_journal_title	Transactions of JWRI
citation_volume	37
citation_issue	2
citation_firstpage	33
citation_lastpage	36
citation_public_url	https://hdl.handle.net/11094/9477
citation_doi_detail	10.18910/9477
citation_doi	https://doi.org/10.18910/9477

Microstructural and Phase Analysis of Zirconium and Copper Binary Thin Film Sputtered by using Elemental Composite Targets

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