Structures of Metallic Glass Sputtered Films by Using Zr-Al-Ni-Cu Alloy Targets

Kondoh, Katsuyoshi; Kawabata, Kenshi; Serikawa, Tadashi; Kimura, Hisamichi

doi:https://doi.org/10.18910/9505

Structures of Metallic Glass Sputtered Films by Using Zr-Al-Ni-Cu Alloy Targets

Kondoh, Katsuyoshi; Kawabata, Kenshi; Serikawa, Tadashi et al.

Transactions of JWRI, 2008, 37(1), 109-112

Number of Access:797（2025-10-05 09:44 Counts）

Identifier to cite or link to this item: https://doi.org/10.18910/9505

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Title	Structures of Metallic Glass Sputtered Films by Using Zr-Al-Ni-Cu Alloy Targets
Creator	NRID 1000050345138 1000050345138 researchmap permalink kondoh kondoh Scopus Author ID 9942942300 9942942300 CreatorName Kondoh, Katsuyoshi ; コンドウ, カツヨシ
	NRID 1000050432422 1000050432422 CreatorName Kawabata, Kenshi ; カワバタ, ケンシ
	NRID 1000010345168 1000010345168 CreatorName Serikawa, Tadashi ; セリカワ, タダシ
	NRID 1000000161571 1000000161571 CreatorName Kimura, Hisamichi ; キムラ, ヒサミチ
Subject	Bulk Metallic Glass
	RF-Sputtering
	Thin Film
	Elemental Composite Target
	Crystallization
	Zr Based Alloy
Abstract	Zr-Al-Ni-Cu thin films were deposited by the radio-frequency sputtering method at low substrate temperature using three kinds of targets; Zr₅₅Al₁₀Ni₅Cu₃₀ bulk metallic glass target (α-BMG target), crystallized bulk metallic glass target (c-BMG target), and an elemental composite target composed of each Zr, Al, Ni chips and Cu plate. XRD profiles of the films prepared when using these targets indicated that all of the films showed amorphous structures. While XRD profiles of the films using α and c-BMG targets revealed a broad peak of 2θ=38 degree in the same way as the α-BMG target indicating amorphous structures, that of the film using elemental composite targets showed a broad peak of 2θ=42 degree, which is higher compared to the latter material. As a result of annealing the films at various temperatures for 900 s, the film using the α-BMG target showed a crystallization temperature of 748 K, higher than that of BMG with723K, while the other films had lower crystallization temperatures below 723K. XRD profiles also indicated that the crystallized compounds of the films were different from those of BMG target.
Publisher	大阪大学接合科学研究所
	オオサカダイガクセツゴウカガクケンキュウジョ
	Joining and Welding Research Institute, Osaka University
Source Title	Transactions of JWRI
Volume (Issue)	37(1)
Page	109-112
Date of Issued	2008-07
Language	English
Handle URL	https://hdl.handle.net/11094/9505
DOI	https://doi.org/10.18910/9505
PISSN	03874508
NCID	AA00867058
Access Rights	open access
oaire:version	Version of Record
Category	紀要論文 Departmental Bulletin Paper
Category	Transactions of JWRI / Vol.37 No.1 (2008-07)

Resource Type	departmental bulletin paper
Local Type	Departmental Bulletin Paper
DCMI Type	Text
DCTERMS.bibliographicCitation	Transactions of JWRI. 2008, 37(1), p. 109-112
DC.title	Structures of Metallic Glass Sputtered Films by Using Zr-Al-Ni-Cu Alloy Targets
DC.creator	Kondoh, Katsuyoshi
	コンドウ, カツヨシ
	Kawabata, Kenshi
	カワバタ, ケンシ
	Serikawa, Tadashi
	セリカワ, タダシ
	Kimura, Hisamichi
	キムラ, ヒサミチ
DC.publisher	大阪大学接合科学研究所
	オオサカダイガクセツゴウカガクケンキュウジョ
	Joining and Welding Research Institute, Osaka University
DC.language' scheme='DCTERMS.RFC1766	English
DC.type' scheme='DCTERMS.DCMIType	Text
DCTERMS.issued' scheme='DCTERMS.W3CDTF	2008-07
DC.subject	Bulk Metallic Glass
	RF-Sputtering
	Thin Film
	Elemental Composite Target
	Crystallization
	Zr Based Alloy
DCTERMS.abstract	Zr-Al-Ni-Cu thin films were deposited by the radio-frequency sputtering method at low substrate temperature using three kinds of targets; Zr₅₅Al₁₀Ni₅Cu₃₀ bulk metallic glass target (α-BMG target), crystallized bulk metallic glass target (c-BMG target), and an elemental composite target composed of each Zr, Al, Ni chips and Cu plate. XRD profiles of the films prepared when using these targets indicated that all of the films showed amorphous structures. While XRD profiles of the films using α and c-BMG targets revealed a broad peak of 2θ=38 degree in the same way as the α-BMG target indicating amorphous structures, that of the film using elemental composite targets showed a broad peak of 2θ=42 degree, which is higher compared to the latter material. As a result of annealing the films at various temperatures for 900 s, the film using the α-BMG target showed a crystallization temperature of 748 K, higher than that of BMG with723K, while the other films had lower crystallization temperatures below 723K. XRD profiles also indicated that the crystallized compounds of the films were different from those of BMG target.
DC.identifier	10.18910/9505
DC.format	9505
citation_title	Structures of Metallic Glass Sputtered Films by Using Zr-Al-Ni-Cu Alloy Targets
citation_author	Kondoh, Katsuyoshi
	Kawabata, Kenshi
	Serikawa, Tadashi
	Kimura, Hisamichi
citation_publisher	大阪大学接合科学研究所
citation_language	English
citation_date	2008-07
citation_journal_title	Transactions of JWRI
citation_volume	37
citation_issue	1
citation_firstpage	109
citation_lastpage	112
citation_public_url	https://hdl.handle.net/11094/9505
citation_doi_detail	10.18910/9505
citation_doi	https://doi.org/10.18910/9505

Structures of Metallic Glass Sputtered Films by Using Zr-Al-Ni-Cu Alloy Targets

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