A shock-tracking algorithm for surface evolution under reactive-ion etching

Hamaguchi, S.; Dalvie, M.; Farouki, R. T. et al.

Journal of Applied Physics, 1993, 74(8), 5172-5184

Number of Access:265（2025-08-28 19:19 Counts）

Identifier to cite or link to this item: https://hdl.handle.net/11094/78508

Link to primary information 

File Format Terms of use Size Views Date.Available Description information
JVacSciTechnolB_74_08_5172 pdf None 1.85 MB 227 2021.02.05  

Item Information

Output File Export EndNote Basic Export Mendeley

Title
A shock-tracking algorithm for surface evolution under reactive-ion etching
Creator
NRID
1000060301826 1000060301826
ORCID
0000-0001-6580-8797 0000-0001-6580-8797
researchmap permalink
satoshi_hamaguchi satoshi_hamaguchi
Scopus Author ID
55220082400 55220082400
CreatorName
Hamaguchi, S.
CreatorName
Dalvie, M.
CreatorName
Farouki, R. T.
CreatorName
Sethuraman, S.
Description
S. Hamaguchi et al., Journal of Applied Physics 74, 5172 (1993) https://doi.org/10.1063/1.354282
Abstract
A new algorithm that determines the evolution of a surface eroding under reactive-ion etching is presented. The surface motion is governed by both the Hamilton-Jacobi equation and the entropy condition for a given etch rate. The trajectories of "shocks" and "rarefaction waves" are then directly tracked, and thus this method may be regarded as a generalization of the method of characteristics. This allows slope discontinuities to be accurately calculated without artificial diffusion. The algorithm is compared with "geometric" surface evolution methods, such as the line-segment method.
Publisher
American Institute of Physics Inc.
Source Title
Journal of Applied Physics
Volume (Issue)
74(8)
Page
5172-5184
Date of Issued
1993-10-15
Language
English
Handle URL
https://hdl.handle.net/11094/78508
PISSN
00218979
NCID
AA00693547
Relation.isIdenticalTo
DOI (Publisher Version)
https://doi.org/10.1063/1.354282
Access Rights
open access
CopyRight
This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. This article appeared in Journal of Applied Physics 74, 5172 (1993) and may be found at https://doi.org/10.1063/1.354282.
oaire:version
Version of Record
Category
学術雑誌論文 Journal Article